2012
DOI: 10.1039/c2jm32509h
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Fabrication of ZnO nano-structures using UV nanoimprint lithography of a ZnO nano-particle dispersion resin

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Cited by 28 publications
(17 citation statements)
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“…Figure 2 a,d shows, respectively, the SEM and AFM images obtained of the flat mesoporous ZnO layer produced on glass by spin coating and annealing. In Figure 2 b,e, we see that that the subsequent UV-NIL process successfully replicates the pattern of the master stamp with a high degree of fidelity; however, the pattern size is shrunk due to the solvent in the ZnO NP dispersion resin being absorbed into the PDMS mold and removed during the UV-NIL process [ 17 ]. Thus, in the mesoporous ZnO pattern, the diameter and height of the micro-cone-shaped structure are reduced to 2.2 and 0.7 μm, respectively.…”
Section: Resultsmentioning
confidence: 99%
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“…Figure 2 a,d shows, respectively, the SEM and AFM images obtained of the flat mesoporous ZnO layer produced on glass by spin coating and annealing. In Figure 2 b,e, we see that that the subsequent UV-NIL process successfully replicates the pattern of the master stamp with a high degree of fidelity; however, the pattern size is shrunk due to the solvent in the ZnO NP dispersion resin being absorbed into the PDMS mold and removed during the UV-NIL process [ 17 ]. Thus, in the mesoporous ZnO pattern, the diameter and height of the micro-cone-shaped structure are reduced to 2.2 and 0.7 μm, respectively.…”
Section: Resultsmentioning
confidence: 99%
“…This is based on the fact that a large portion of incident light is reflected at the interface formed between layers with a large difference in refractive index, which can be minimized by introducing an additional layer with an intermediate refractive index to create a more gradual change. In this study, we formed mesoporous ZnO pattern on glass substrates for light-scattering effect by using ultraviolet nanoimprint lithography (UV-NIL) [ 17 , 18 ]. The mesoporous ZnO pattern provides strong scattering of light since it has two light-scattering centers.…”
Section: Introductionmentioning
confidence: 99%
“…Especially imprinting with negative polydimethylsiloxane (PDMS) molds and ultraviolet (UV) curable materials, soft embossing has emerged as a novel technology for polymer micro-structures fabrication [16]- [18]. Compared with other micro-structure fabrication technologies including the injection molding [19], diamond tooling [20], hot embossing [21], and laser processing [22], soft embossing is simple and highly efficient.…”
Section: Introductionmentioning
confidence: 99%
“…17,18 However, the fabrication of nanoscale-patterned sapphire substrate (NPSS) generally requires electron-beam lithography and nanoimprint techniques, which makes the advantage of performance improvement to be offset by the increased fabrication cost. 19,20 Nanosphere lithography (NSL) technique, which is based on a monolayer-colloidal-crystal (MCC) templating strategy, has been employed as an economic way to construct largearea and highly ordered nanostructures, 21,22 which have demonstrated important applications in the optoelectronic devices. [23][24][25][26] Recently, NSL has been utilized to prepare NPSS with the advantage of large-area fabrication and flexible tuning of the feature size.…”
Section: Introductionmentioning
confidence: 99%