Fabrication technology for single-material MEMS using polycrystalline diamond

Cao, Zhong; Aslam, D.M.

doi:10.1016/j.diamond.2010.06.005

Cited by 26 publications

(17 citation statements)

References 102 publications

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“…The structure in Fig.1 includes three poly-C layers with various doping levels serving as insulation layer, semiconducting layer (piezoresistor) and conducting layer, respectively. This all-diamond structure was demonstrated in more detail in [7], which can help (a) alleviate problems related to multi-material layers (thermal mismatch, adhesion, inter-layer diffusion, contact resistance), (b) utilize unique properties of the material and (c) lower the overall fabrication cost.…”

Section: Methodsmentioning

confidence: 98%

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Piezoresistive sensor technology for RFMEMS using p-type polycrystalline diamond

Cao

Aslam

2009

2009 IEEE Nanotechnology Materials and Devices Conference

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Design, simulation, fabrication and testing of p-type polycrystalline diamond (poly-C) piezoresistive RFMEMS is reported for the first time. The use piezoresistive detection in RFMEMS can lead to an output impedance in the ranges of 20 -500 Ω and several MΩ for intra-and inter-grain piezoresistors, respectively. The inter-grain gauge factor of the poly-C film with a resistivity of 22 ⋅ Ω cm was estimated to be over 20. An Ohmic contact with a contact resistance of 5.21 MΩ was achieved by using a highly-doped poly-C interlayer between metal and lightly-doped piezoresistor.

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Section: Methodsmentioning

confidence: 98%

“…While the intra-grain detection will be the subject of subsequent publications, the inter-grain piezoresistors, with a gauge factor in the range of 20, are discussed in the current paper. Another unique feature of the current work is the use of single-material MEMS (SMM) [7]. An overview of poly-C piezoresistive MEMS is shown in Fig.…”

Section: Introductionmentioning

confidence: 99%

Piezoresistive sensor technology for RFMEMS using p-type polycrystalline diamond

Cao

Aslam

2009

2009 IEEE Nanotechnology Materials and Devices Conference

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“…Thus, four primary diamond dry-etching methods that are compatible with classical clean room lithographic techniques have been reported over the years. 45 They include electron cyclotron etching (ECR), ion bean etching (IBE), reactive ion etching (RIE) and inductively coupled plasma etching (ICP). The most frequently used gases for etching diamond using these techniques are O 2 , CF 4 and SF 6 .…”

Section: Fabrication Methodsmentioning

confidence: 99%

Diamond-based Resonators for Chemical Detection

Scorsone

Trouvé

2014

Nanodiamond

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Chemical/biochemical sensors are devices that transform chemical or biological information into an analytically useful signal. Generally speaking, they are the result of coupling a selective layer to a physical part known as the transducer. The sensors may be classified according to the operating principle of the transducer. In brief, the main transduction phenomena are optical, electrochemical, electrical and gravimetric. 1 A wide variety of innovative chemical and biochemical sensor technologies are being reported in the literature every year, often showing highly promising performances. However, when it comes to commercial sensors, one has to admit that the market is very conservative. A possible explanation for this is the lack of robustness and reliability of the newly developed sensors and, therefore, their difficulty to maintain performance specifications under adverse operating conditions. 2 The robustness of the sensors is linked, on the one hand, to their ability to withstand mechanical shocks, stresses, or vibrations. On the other hand, it is related the chemical stability of the selective layer in the operating environment. The variety of exceptional physicochemical properties of diamond materials are generally extremely resilient to chemical degradation. They also feature outstanding mechanical properties, such as a high Young's RSC Nanoscience & Nanotechnology No.

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“…Reactive ion etching is a common method for diamond patterning [5][6][7][8] that involves a reactive gas like SF 6 and a highly selective masking material such as gold. This process suffers from the problems of over etching and micro mask effect [9,10]. In this paper, we describe a novel method for selective growth of a nanodiamond film in a MW, which is compatible with conventional Si processing.…”

Section: Introductionmentioning

confidence: 99%

Selective growth of nanodiamond films in microwave plasma

Albin

Williams

Zhou

et al. 2012

Composite Interfaces

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A patterned nanodiamond film is grown using microwave plasma-enhanced chemical vapor deposition. A selective growth method compatible with traditional silicon processing is described. A diamond pattern of high quality and moderate resolution is achieved. The process utilized is simple to generate patterns without etching diamond. A rectifying junction is demonstrated using a p-type nanodiamond and p-type silicon heterojunction with rectifying ratio of two orders of magnitude. This simple patterning technique could be applied in the fabrication of diamond electronic and mechanical devices and biological sensors. The plasma emission spectra indicate the presence of both CH and C 2 species, which are responsible for diamond growth. IntroductionAmong many methods employed for diamond film growth, chemical vapor deposition (CVD) using microwave (MW) plasma is quite popular due to several reasons. The well-confined plasma does not touch the reaction chamber walls and can be produced directly on the substrate. Hence, contamination in the grown films can be minimized unlike in hot filamentbased CVD. Indirect substrate heating is also achieved by the MW. Diamond films and coatings have found wide ranging applications in sensors [1], protective coatings [2], optical windows [3], and electronic and electrochemical devices [4]. Many such applications require patterning of diamond thin films. However, the unusual chemical inertness and hardness makes patterning of diamond quite difficult. Reactive ion etching is a common method for diamond patterning [5-8] that involves a reactive gas like SF 6 and a highly selective masking material such as gold. This process suffers from the problems of over etching and micro mask effect [9,10]. In this paper, we describe a novel method for selective growth of a nanodiamond film in a MW, which is compatible with conventional Si processing. A rectifying isotype junction is demonstrated using a p-type nanodiamond (p-NCD)/p-type silicon (p-Si) heterojunction diode with rectifying ratio of two orders of magnitude. Diamond patterns are achieved without dry etching.

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Fabrication technology for single-material MEMS using polycrystalline diamond

Cited by 26 publications

References 102 publications

Piezoresistive sensor technology for RFMEMS using p-type polycrystalline diamond

Piezoresistive sensor technology for RFMEMS using p-type polycrystalline diamond

Diamond-based Resonators for Chemical Detection

Selective growth of nanodiamond films in microwave plasma

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