Facile large-area photolithography of periodic sub-micron structures using a self-formed polymer mask

Abstract

This letter reports the methodology of a low-cost fabrication technique for producing periodic sub-micron structures over a large area, using a polymer mask. A thin film of gold/palladium or silica is deposited on a stretched polydimethylsiloxane (PDMS) substrate. Release of the tension forms a buckling sinusoidal pattern on the surface. The PDMS substrates are then used as masks in soft contact optical lithography, bypassing the need for an expensive lithographic process toward creating regular patterns on a traditional masks. Pattern transfers are conducted using an ultraviolet lamp and the fabrication of more complex periodic structures through multiple exposures is reported.

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Particle ordering in colloidal thin films deposited by flow‐coating

“…Top‐down techniques are usually lithographic, for example, photolithography, e‐beam lithography, and nanoimprint lithography, which have a high level of precision and reproducibility. However, these processes involve expensive equipment that increase both fabrication time and cost.…”

Realization of III–V Semiconductor Periodic Nanostructures by Laser Direct Writing Technique

“…Electron beam lithography (EBL), deep ultraviolet lithography, interference lithography, scanning probe microscope (SPM) lithography, and nanoimprint lithography (NIL) are well-known techniques to fabricate nanometer and submicron feature structures [11–15], but expensive equipment is required for EBL, deep ultraviolet lithography, and interference lithography and the serial write mechanism of SPM lithography and EBL makes large-area patterning costly and time-consuming [16]. Although nanoimprint lithography is relatively low cost compared to those mentioned above, the initial submicron patterning technique required to fabricate a master mold or masking pattern is still an essential process [16].…”

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