2020
DOI: 10.1088/1361-6501/ab7315
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Far-field sectioning for the retrieval of subwavelength grating parameters using coherent Fourier scatterometry

Abstract: Optical inspection of periodic nanostructures is a major challenge in the semiconductor industry due to constantly decreasing critical dimensions. In this paper we combine coherent Fourier scatterometry (CFS) with a sectioning mask for subwavelength grating parameter determination. By selecting only the most sensitive regions of the scattered light in the Fourier plane, one can retrieve grating parameters faster and with higher sensitivity than previous approaches. Moreover, the full process of CFS using focus… Show more

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Cited by 3 publications
(1 citation statement)
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“…The more structure parameters there are in the mathematical NW model, the more advanced geometrical shapes can be simulated. The principles of scatterometry are explained in more detailed in these publications [18][19][20].…”
Section: Coherent and Partially Coherent Fourier Scatterometrymentioning
confidence: 99%
“…The more structure parameters there are in the mathematical NW model, the more advanced geometrical shapes can be simulated. The principles of scatterometry are explained in more detailed in these publications [18][19][20].…”
Section: Coherent and Partially Coherent Fourier Scatterometrymentioning
confidence: 99%