Proceedings International Conference on Computer Design VLSI in Computers and Processors
DOI: 10.1109/iccd.1997.628944
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Fast generation of statistically-based worst-case modeling of on-chip interconnect

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Cited by 16 publications
(14 citation statements)
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“…Realizing the great importance of process variations, many works have been carried out to model their effect [10,7,2,9,15,1,17,14]. One major objective of these modeling works is to find a reliable estimation on the worst case timing performance induced by process variations, either the worst delay along timing critical paths in timing analysis or the worst skew in a clock network.…”
Section: Introductionmentioning
confidence: 99%
“…Realizing the great importance of process variations, many works have been carried out to model their effect [10,7,2,9,15,1,17,14]. One major objective of these modeling works is to find a reliable estimation on the worst case timing performance induced by process variations, either the worst delay along timing critical paths in timing analysis or the worst skew in a clock network.…”
Section: Introductionmentioning
confidence: 99%
“…Other applications that require the solution of a very large number of "similar" configurations are for instance: the generation of capacitance tables used in macro and fullchip parasitic layout extraction [5], [6]; the extraction of capacitance distributions using sampling based techniques as is found in a number of stochastic extraction techniques such as the Monte Carlo or stochastic collocation algorithm [7]; and the generation of parameterized reduced-order models used in timing and noise analysis.…”
Section: Introductionmentioning
confidence: 99%
“…In the first phase, the 3-sigma values of capacitance, resistance, and partial derivatives of capacitances with respect to selected interconnect process parameters are generated in batch-mode computation as part of an enhanced version of HIVE [2], which is a parameterized interconnect model generator and library for R and C, and the Derivative HIVE Generator. Most of time is spent in derivative calculation in this phase.…”
Section: Statistical Modeling and Differentiating Of Fcap Codesmentioning
confidence: 99%
“…We have developed a methodology [2] for obtaining 3-sigma R (resistance), C (capacitance), crosstalk, and delay given variations in interconnect-related process parameters. This methodology uses FCAP2 and FCAP3 [3] (Fast Capacitance Extraction 2-D and 3-D simulators, respectively) that have been developed at Hewlett Packard Laboratory to study parasitic electrical effects of interconnects and devices.…”
Section: Introductionmentioning
confidence: 99%