“…3 In the past two decades, the flow field developing process after discharge in the chamber and its influence to the next discharge have attracted the attentions of scientists and Engineers for the increasing high-repetitive-rate and stable-discharge demands of repetitively pulsed gas laser application, especially the EUV Lithography application. 4,5,10 The schlieren 6,10 , shadowgraph 11 , and interferometry 5,7 were all applied, and the images of three kinds of shock waves (the longitudinal shock waves in the gas flow direction, the transversal shock waves between the electrodes and the transversal shock waves between optics) were obtained 7,11 . However, most of these works were qualitative or semi-quantitative 5,7,10,11 .…”