Femtosecond laser internal manufacturing of three-dimensional microstructure devices

Zheng, Chao; Hu, Anming; Chen, Tao; Oakes, Ken D.; Liu, Shibing

doi:10.1007/s00339-015-9403-x

Cited by 12 publications

(2 citation statements)

References 147 publications

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“…Among the top technological achievements of the last century in nanofabrication, photon-assisted processing methods are with no doubt the more technologically advanced ones. Photolithography combined with dry or wet etching of the hard metal oxides is today available with acceptable performances in terms of quality, versatility, resolution, throughput, cost, and achievable morphologies. − Still, these methods remain cumbersome and are constrained by a limited choice of required photosensitive selective masks, containing complex organic radicals or cationic nonlinear absorbers (photoinitiators) which are expensive, often colored, poorly soluble in photopolymers, and could be toxic . Furthermore, photolithography faces an intrinsic critical limitation in resolution dictated by the wavelength of incident writing light waves (high-energy ultraviolet radiation (deep-UV) is used nowadays in production lines to elaborate features smaller than 40 nm).…”

Section: Generalities On Nanofabrication Techniques and Nilmentioning

confidence: 99%

Nanoimprint Lithography Processing of Inorganic-Based Materials

et al. 2021

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We review past and recent progress in Nano-Imprint Lithography (NIL) methods to (nano-) structure inorganic materials from sol-gel liquid formulations and colloidal suspensions onto a surface. This technique, first inspired by embossing techniques, was developed for soft polymer processing, as final or intermediate materials, but is today fully adapted to hard inorganic materials with high dielectric constant, such as metal oxides, with countless chemical compositions provided by the sol-gel chemistry. Consequently, NIL has become a versatile, high throughput, and highly precise microfabrication method that is mature for lab developments and scaling up. We first describe the state-of-the-art in nanofabrication methods and the plethora of approaches developed in the last decades to imprint metal oxides from inorganic solutions. These are discussed and compared in terms of performances, issues, and ease of implementation. The final part is devoted to relevant applications in domains of interest. Generalities on Nano fabrication techniques and NILFrom the early ages, technics to cut, sculpt, etch, mold, assemble pieces of matter have been developed and constantly optimized to satisfy the growing demand for functional materials. Since the inception of nanotechnology, these operations have to be mastered at the nanoscale. For these tasks, many top-down and bottom-up methods exist. However, they do not simultaneously fulfill all the necessary criteria of performance such as spatial resolution, pattern complexity, hierarchy, scalability, dimensionality, costeffectiveness, a span of processable materials. Thus, motivations to optimize them and develop new ones persist as a flourishing domain of research and development.Many materials exhibiting various intrinsic properties (mechanical, chemical, electrical, optical, thermal, etc.) are exploited in numberless functions once nanostructured onto a surface. Amongst them, metal oxides are extremely valuable for their extreme chemical, mechanical and thermal stability and range of physicalchemical properties. Thanks to its hardness, chemical inertness, transparency and low background fluorescence, glass is one of the preferred choices for micro-and nano-fluidics device fabrication. In photonics, metasurfaces require optical properties that are found in dielectrics such as SiO2 often combined with high index dielectric TiO2 or (plasmonic) gold 1 . For nano-electronics, silica remains one of the key

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Section: Generalities On Nanofabrication Techniques and Nilmentioning

confidence: 99%

Nanoimprint Lithography Processing of Inorganic-Based Materials

et al. 2021

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“…Onedimensional structures (nanowires or nanorods) of nanometer-scale gallium nitride [3,4] also are known to have great prospects in fundamental physical science and novel technological applications [5,6]. For the past several years, considerable effort has been placed on the synthesis of nanowires using laser ablation [7], template synthesis and catalytic synthesis of GaN nanorods [8], sublimation of GaN powder under a flowing ammonia atmosphere [9], and direct reaction of metal Ga vapor with flowing ammonia [10].…”

Section: Introductionmentioning

confidence: 99%

Structure-related optical behavior of nanoscale GaN island, tip, tube and cone arrays formed by inductively coupled plasmas etching

et al. 2016

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We introduce a one-step self-assembled technique to form various nanostructures on N-type GaN film and then present an optical characterization of a series of low-dimensional GaN nanostructures by using low-temperature photoluminescence (LTPL) spectroscopy. Nanoscale GaN island, tip, tube and cone-like structures of diameters ranging from 50 to 190 nm were self-assembled on a c-axis perpendicular to substrate surface with uniform diameter and uniform length by inductively coupled plasmas etching process without lithography. Optical LTPL measurements on nanostructures show consistent variations in the properties of the fabricated GaN structures as a function of surface area of GaN nanostructures. LTPL mapping gives an evidence for defect-induced donors and/ or acceptors near the facets of the ICP-etched nanostructure. Our results indicate that a higher concentration of donor-related defects is introduced on the surface of GaN nanotubes. In particular, the nanotubes sample exhibits a conspicuous increased in yellow luminescence intensity compared to the other nanostructure samples. This result may support more information for the application of nanotubes on nanogenerators.

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Introduction to Laser Micro-to-Nano Manufacturing

Bai

et al. 2020

Laser Micro-Nano-Manufacturing and 3D Microprinting

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Femtosecond laser internal manufacturing of three-dimensional microstructure devices

Cited by 12 publications

References 147 publications

Nanoimprint Lithography Processing of Inorganic-Based Materials

Nanoimprint Lithography Processing of Inorganic-Based Materials

Structure-related optical behavior of nanoscale GaN island, tip, tube and cone arrays formed by inductively coupled plasmas etching

Introduction to Laser Micro-to-Nano Manufacturing

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