2016 IEEE International Electron Devices Meeting (IEDM) 2016
DOI: 10.1109/iedm.2016.7838401
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Ferroelectric HfZrO<inf>x</inf> Ge and GeSn PMOSFETs with Sub-60 mV/decade subthreshold swing, negligible hysteresis, and improved I<inf>ds</inf>

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Cited by 85 publications
(48 citation statements)
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“…The fact that the ferroelectric material can exhibit such a state of negative capacitance has already been demonstrated. 3,4,[6][7][8][9][10][11][12][13][14][15][16][17][18] Therefore, if another dielectric capacitor is placed in series with the ferroelectric [as shown schematically in Fig. 1(b)], a voltage amplification is expected across the dielectric capacitor.…”
mentioning
confidence: 99%
“…The fact that the ferroelectric material can exhibit such a state of negative capacitance has already been demonstrated. 3,4,[6][7][8][9][10][11][12][13][14][15][16][17][18] Therefore, if another dielectric capacitor is placed in series with the ferroelectric [as shown schematically in Fig. 1(b)], a voltage amplification is expected across the dielectric capacitor.…”
mentioning
confidence: 99%
“…5(b) and (c), NCFETs show negative differential resistance (NDR) [16] [30], which is a distinctive feature that is not seen in the conventional MOSFET. In a Gunn diode, known as a transferred-electron device, NDR is induced by the transition of electrons from a high-mobility valley to a low-mobility valley [31].…”
Section: B Drain-induced Barrier Raising (Dibr)mentioning
confidence: 99%
“…Several models of quasi-static NC associated with domain wall motion in a multiple-domain system have been also proposed [9][10][11][12][13] . Meanwhile, steep SS values have been demonstrated by incorporating FE/PE gate stacks into FETs with various FE materials [14][15][16] , various channel materials 15,[17][18][19] and various FET structures 14,[20][21][22][23][24] .…”
mentioning
confidence: 99%