Fifth-order aberration analysis of a combined electrostatic-magnetic focusing-deflection system

Uno, Y.; Morita, Hirofumi; Simazu, Nobuo; Hosokawa, T.

doi:10.1016/0168-9002(95)00253-7

Cited by 5 publications

(3 citation statements)

References 5 publications

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“…In this section, a suitable method is outlined and its use is illustrated by a simple example. A somewhat similar approach is currently being reported by Uno et al (1995). The method is a general extension of that reported previously by Chu & Munro ( 1 9 8 2 ) for the primary aberrations.…”

Section: Az (Mm)mentioning

confidence: 71%

High‐order and multipole aberrations by aberration integral and direct ray‐tracing methods

Munro¹,

Zhu²,

Rouse³

1995

Journal of Microscopy

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SUMMARY This paper describes methods for computing high‐order aberrations and multipole aberrations in electron optical systems. Two approaches are discussed – the first involves obtaining aberration integrals for the high‐order aberration coefficients, in terms of paraxial rays and axial field functions, while the second method uses direct ray‐tracing through fields computed accurately by finite element or finite difference methods. The methods are illustrated by several examples, including a wide‐angle focusing and deflection system with fifth‐order aberrations, a combined magnetic and electrostatic lens, a ‘supertip’ ion source, an electron mirror with negative spherical and chromatic aberration, and a chromatically corrected quadrupole lens.

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Section: Az (Mm)mentioning

confidence: 71%

High‐order and multipole aberrations by aberration integral and direct ray‐tracing methods

Munro¹,

Zhu²,

Rouse³

1995

Journal of Microscopy

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show abstract

“…By combining equation (6) with equation ( 5) and considering the second and third vector identities in equation ( 1), the fifth-order aberration is expanded in the form of the sum of individual particular aberrations:…”

Section: Analytical Formulae Of Aberration Coefficientsmentioning

confidence: 99%

“…The study of fifth-order geometric aberrations of rotationally symmetric electron optical systems can be traced back to the middle of the twentieth century [1]. Since then, the investigation of the aberration has been continued [2][3][4][5][6][7] not only to develop the electron optical aberration theory, but also to further improve properties of electron optical systems. However, analytical expressions of fifth-order geometric aberration coefficients published in the above references are rather too complicated.…”

Section: Introductionmentioning

confidence: 99%