2015
DOI: 10.1016/j.phpro.2015.08.314
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Film Deposition and their Removal in Gaps and Regions Shaded from the Plasma in the Presence of RF Fields

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Cited by 2 publications
(5 citation statements)
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“…One must mention that the gap between the SS holder and the tile was very narrow (below 100 µm); nevertheless, large amount of carbon was deposited in this gap. This observation is in line with observations described in [24,25], where carbon films were found in very narrow gaps between two surfaces tightly attached to each other. This was explained by decomposition of volatile hydrocarbons in the high frequency electric fields produced by auto-oscillating high frequency discharges in the magnetic field [24].…”
Section: Elemental Composition Of Depositssupporting
confidence: 93%
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“…One must mention that the gap between the SS holder and the tile was very narrow (below 100 µm); nevertheless, large amount of carbon was deposited in this gap. This observation is in line with observations described in [24,25], where carbon films were found in very narrow gaps between two surfaces tightly attached to each other. This was explained by decomposition of volatile hydrocarbons in the high frequency electric fields produced by auto-oscillating high frequency discharges in the magnetic field [24].…”
Section: Elemental Composition Of Depositssupporting
confidence: 93%
“…One can hardly expect that particles from plasma may penetrate so deep into so narrow gaps. For explanation of this observation, we suggest a mechanism associated with auto-oscillating discharges, which was proposed in [24][25][26]. These discharges arise between two surfaces (for example the external surface of a W tile and the wall of the tokamak) connected by the magnetic field.…”
Section: Discussionmentioning
confidence: 67%
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