2016
DOI: 10.2320/matertrans.me201503
|View full text |Cite
|
Sign up to set email alerts
|

Finely Controlled Approaches to Formation of Heusler-Alloy/Semiconductor Heterostructures for Spintronics

Abstract: We present recent progress of the low-temperature growth of Heusler-alloy/silicon(Si) or Heusler-alloy/germanium(Ge) heterostructures and of their applications for spintronics. First, a concept of the realization of the low-temperature heteroepitaxy for high-quality Heusler alloy/ Si or Heusler alloy/Ge heterostructures is shown. Despite very low-growth temperatures, B2 or L2 1 ordered full-Heusler alloys are achieved. Next, by applying this concept to the growth of Ge on a Heusler alloy or a Heusler alloy on … Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2

Citation Types

0
18
0

Year Published

2017
2017
2021
2021

Publication Types

Select...
7

Relationship

2
5

Authors

Journals

citations
Cited by 15 publications
(18 citation statements)
references
References 72 publications
0
18
0
Order By: Relevance
“…13 FM/SC/FM hybrid trilayers could be grown with a variety of Heusler alloys in combination with Ge and Si in the (111) orientation using surfactant-mediated MBE 14 and low-temperature MBE. 11,32 However, the (001) orientation is preferable as it is more frequently used for semiconductor technology.…”
mentioning
confidence: 99%
“…13 FM/SC/FM hybrid trilayers could be grown with a variety of Heusler alloys in combination with Ge and Si in the (111) orientation using surfactant-mediated MBE 14 and low-temperature MBE. 11,32 However, the (001) orientation is preferable as it is more frequently used for semiconductor technology.…”
mentioning
confidence: 99%
“…Here we set the supplied atomic composition ratio of Co:Fe or Mn:Si to 2.0:1.0:1.0 during the growth. 55 Structural characterizations were investigated by using in situ RHEED observations, X-ray diffraction (XRD), high-angle annular dark-field scanning transmission electron microscopy (HAADF-STEM), and energy dispersive X-ray spectroscopy (EDX) measurements. Magnetic properties were measured by using a vibrating sample magnetometer in a physical property measurement system (Quantum Design).…”
Section: Crystal Structures and Experimental Methodsmentioning
confidence: 99%
“…Cooling the substrates down to <80 °C, we grew Co 2 FeSi and Co 2 MnSi films with a thickness of ∼25 nm by coevaporating Co, Fe, or Mn, and Si elements by using Knudsen cells, as schematically illustrated in Figure a. Here we set the supplied atomic composition ratio of Co:Fe or Mn:Si to 2.0:1.0:1.0 during the growth . Structural characterizations were investigated by using in situ RHEED observations, X-ray diffraction (XRD), high-angle annular dark-field scanning transmission electron microscopy (HAADF-STEM), and energy dispersive X-ray spectroscopy (EDX) measurements.…”
Section: Crystal Structures and Experimental Methodsmentioning
confidence: 99%
“…Considering these facts, we utilize vertically stacked ferromagnet (FM)/Ge/FM spin-valve structures that we have already developed. 29,[37][38][39][40] Recently, since we already observed the spin-dependent transport through undoped p-Ge up to room temperature using an all-epitaxial CoFe/Ge/Fe 3 Si trilayer structure despite the very short spin diffusion length less than 100 nm, 29) the detection of the spin transport in Sb-doped Ge can be expected for the vertically stacked spin-valve structure.…”
mentioning
confidence: 98%
“…45) Then, the Fe 3 Si surface was terminated with two monolayers of Si. 37,46,47) Subsequently, by combining solid phase epitaxy (SPE) and MBE with Sb doping, the Sbdoped Ge layer (∼150 nm) was grown on top of the Fe 3 Si layer. Detailed growth procedures have been published elsewhere.…”
mentioning
confidence: 99%