Finite Element Analysis of Alternating Phase-Shift Masks Subjected to Dynamic Pressure Loading Due to Megasonic Cleaning

Yin, Xin; Komvopoulos, K.

doi:10.1109/eptc.2008.4763473

2008 10th Electronics Packaging Technology Conference 2008

DOI: 10.1109/eptc.2008.4763473

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Finite Element Analysis of Alternating Phase-Shift Masks Subjected to Dynamic Pressure Loading Due to Megasonic Cleaning

Xin Yin¹,

K. Komvopoulos²

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Cited by 2 publications

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Fundamental study of droplet spray characteristics in photomask cleaning for advanced lithography

Liu

et al. 2010

SPIE Proceedings

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The fundamentals of droplet-based cleaning of photomasks are investigated and performance regimes that enable the use of binary spray technologies in advanced mask cleaning are identified. Using phase Doppler anemometry techniques, the effect of key performance parameters such as liquid and gas flow rates and temperature, nozzle design, and surface distance on droplet size, velocity, and distributions were studied. The data are correlated to particle removal efficiency (PRE) and feature damage results obtained on advanced photomasks for 193-nm immersion lithography.

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Fundamental study of droplet spray characteristics in photomask cleaning for advanced lithography

Liu

et al. 2010

SPIE Proceedings

View full text Add to dashboard Cite

show abstract

Megasonic cleaning: possible solutions for 22nm node and beyond

et al. 2011

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Finite Element Analysis of Alternating Phase-Shift Masks Subjected to Dynamic Pressure Loading Due to Megasonic Cleaning

Cited by 2 publications

References 7 publications

Fundamental study of droplet spray characteristics in photomask cleaning for advanced lithography

Fundamental study of droplet spray characteristics in photomask cleaning for advanced lithography

Megasonic cleaning: possible solutions for 22nm node and beyond

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