The formation mechanism, defect characterization, and
potential
applications of the Si vacancy (VSi) with internal H atoms
in the silicon carbide (SiC) materials have been widely investigated.
However, the inherent electronic properties and related phenomena
induced by internal H dynamics in VSi, especially the C-radical
spin interaction dynamics, are still poorly understood in such nano
SiC. In this work, using the density functional calculations, we explore
the magnetic coupling characteristics and dynamic behaviors induced
by H-motion in nano SiC with four different types of H-doped VSi defect centers, (VSi + H)−,
(VSi + H)+, (VSi + 2H), and NVH [i.e.,
(NCVSi + H)0 in which one of C-radical
sites in VSi is replaced by N]. Our results reveal their
unique ferromagnetic (FM) or antiferromagnetic (AFM) spin coupling
characteristics and H-motion-induced interconversion. In general,
the internal H-motion goes through the electron-coupled proton transfer
(ECPT) in a C–H···C unit which has great impact
on molecular orbitals, spin densities, and thus spin couplings among
the C-radicals, allowing the VSi center to undergo magnetic
switching between FM and AFM coupling. Interestingly, as in the (VSi + H)− center, such ECPT can further drive
the excess electron delocalized on three C-radicals to gather at the
ECPT unit, forming a three-center-four-electron (3c–4e) [C···H···C]− covalent H-bond with the switching of magnetic coupling.
This work provides the dynamics insights into the spin coupling characteristics
and its regulation by internal H-motion and multiple radical characters
of such defect materials and the formation of a 3c–4e H-bond
assisted by excess electron, and also provides inspired information
for the design of inorganic magnetic materials and logic devices which
can be controlled by interior doping and dopant dynamics.