2002
DOI: 10.1557/proc-749-w20.10
|View full text |Cite
|
Sign up to set email alerts
|

First-principles calculation of the effect of strain on the diffusion of Ge adatoms on Si and Ge (001) surfaces

Abstract: First-principles calculations are used to calculate the strain dependencies of the binding and diffusionactivation energies for Ge adatoms on both Si͑001͒ and Ge͑001͒ surfaces. Our calculations reveal that the binding and activation energies on a strained Ge͑001͒ surface increase and decrease, respectively, by 0.21 and 0.12 eV per percent compressive strain. For a growth temperature of 600°C, these strain-dependencies give rise to a 16-fold increase in adatom density and a fivefold decrease in adatom diffusivi… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1

Citation Types

1
9
0

Year Published

2013
2013
2016
2016

Publication Types

Select...
3
1

Relationship

0
4

Authors

Journals

citations
Cited by 4 publications
(10 citation statements)
references
References 40 publications
1
9
0
Order By: Relevance
“…> 0 means tensile strain, and < 0 compressive strain. In these studies, d typically varies linearly and increases monotonically with increasing over the explored range, [35][36][37][38] although distinct behavior can occasionally occur on some surfaces. 39,40 Our DFT analysis for Pb on Bi2Te3(111) shows that d is not a monotonic function of in the small-regime and has a cusp-like minimum at c ≈ +0.8%, in contrast to the typical behavior on conventional metal or semiconductor surfaces, where the -dependent d is linear for = −1% to +1%.…”
mentioning
confidence: 98%
“…> 0 means tensile strain, and < 0 compressive strain. In these studies, d typically varies linearly and increases monotonically with increasing over the explored range, [35][36][37][38] although distinct behavior can occasionally occur on some surfaces. 39,40 Our DFT analysis for Pb on Bi2Te3(111) shows that d is not a monotonic function of in the small-regime and has a cusp-like minimum at c ≈ +0.8%, in contrast to the typical behavior on conventional metal or semiconductor surfaces, where the -dependent d is linear for = −1% to +1%.…”
mentioning
confidence: 98%
“…has been reported for biaxially strained substrates, e.g., 8.6 for Ag/Ag(111) [142], -5 for Ge/Si(001) [146], -15 for Ge/Ge(001) [146], -2.7 for In/GaAs(001) [144], and from -6.8 to 3.4…”
Section: Discussionmentioning
confidence: 98%
“…The effect of the modification of diffusion barriers, ) , calculations [141][142][143][144][145][146]. The calculations performed with density-functional theory (DFT) [142,[144][145][146] and classical MD [141,143] for adatom diffusion on Si and Ge (001) [141,145,146], Ag (111) [142], GaAs (100) [144] and Lennard-Jonesium (001) [143] surfaces predict that surface strain on the order of 10 -3 -10 -2 can result in the variation of d E by 5-10%.…”
Section: Modification Of Diffusion Barriers By Surface Strainmentioning
confidence: 99%
See 2 more Smart Citations