Flexible devices fabricated by a plate-to-roll nanoimprint lithography system

Xu, Kai‐Da; Luo, Huiwen; Qin, Jin; Yang, Muyi; Guo, Songpo; Wang, Liang

doi:10.1088/1361-6528/aaf26f

Cited by 12 publications

(7 citation statements)

References 24 publications

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“…The main drawback of MDLs is their somewhat complex multilevel geometry. However, with modern imprint lithography, such geometries can be manufactured at high volumes and at low costs (19). Here, we designed several MDLs for the LWIR, fabricated 2 of them, and then experimentally demonstrated the imaging performance using 2 different commercially available LWIR image sensors.…”

mentioning

confidence: 99%

Broadband lightweight flat lenses for long-wave infrared imaging

Meem

Banerji

Majumder

et al. 2019

Proc. Natl. Acad. Sci. U.S.A.

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We experimentally demonstrate imaging in the long-wave infrared (LWIR) spectral band (8 μm to 12 μm) using a single polymer flat lens based upon multilevel diffractive optics. The device thickness is only 10 μm, and chromatic aberrations are corrected over the entire LWIR band with one surface. Due to the drastic reduction in device thickness, we are able to utilize polymers with absorption in the LWIR, allowing for inexpensive manufacturing via imprint lithography. The weight of our lens is less than 100 times those of comparable refractive lenses. We fabricated and characterized 2 different flat lenses. Even with about 25% absorption losses, experiments show that our flat polymer lenses obtain good imaging with field of view of 35° and angular resolution less than 0.013°. The flat lenses were characterized with 2 different commercial LWIR image sensors. Finally, we show that, by using lossless, higher-refractive-index materials like silicon, focusing efficiencies in excess of 70% can be achieved over the entire LWIR band. Our results firmly establish the potential for lightweight, ultrathin, broadband lenses for high-quality imaging in the LWIR band.

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mentioning

confidence: 99%

Broadband lightweight flat lenses for long-wave infrared imaging

Meem

Banerji

Majumder

et al. 2019

Proc. Natl. Acad. Sci. U.S.A.

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“…The laser beam is loosely focused to a light spot with a diameter of about 1.5 mm by a 5× objective. The mask is held by a vacuum chuck and attached onto a flexure stage which can reduce friction while maintaining good contact between the mask and the substrate during the lithography process [36]. The exposure time which controlled by an electric shutter with millisecond timing precision is 30 s in our experiment.…”

Section: Resultsmentioning

confidence: 99%

Deep plasmonic direct writing lithography with ENZ metamaterials and nanoantenna

et al. 2019

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In this article, we demonstrate a specially designed resonant metamaterial with epsilon-near-zero (ENZ) and nanoantenna to enhance the exposure depth in plasmonic direct writing lithography more than 10 times. The ENZ metamaterial composed of a Ag/Si 3 N 4 multilayer thin film, converts the evanescent field generated by the bowtie aperture nanoantenna to propagating waves with low divergence and high collimation. Deep sub-diffraction limited resolution of less than 65 nm (λ/7) with exposure depth greater than 100 nm is achieved. This work brings plasmonic direct writing lithography one step closer to practical applications.

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“…Therefore, micro-nano patterning technology is becoming more and more important. As a novel micro-nano manufacturing method, nanoimprint lithography has great application prospect [4,5], especially the directly metal imprint technology of microstructure [6], which has few process steps and lower cost. It may be applied in the integrated circuit metallization process [7], metal metamaterial microstructure [8], intelligence sensor [9], microactuators [10], radio frequency micro-electro-mechanical system [11], metal passive components [12] etc.…”

Section: Introductionmentioning

confidence: 99%

Ag metal interconnect wires formed by pseudoplastic nanoparticles fluid imprinting lithography with microwave assistant sintering

liu¹,

Yu²,

hu³

et al. 2022

Nanotechnology

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Nanoimprint technology has the advantages of low cost, high precision, high fidelity and high yield. The metal nanoparticle fluid is non-Newtonian fluid，which is used as the imprint transfer medium to realize high fidelity of pattern because of its the shear thinning effect. In order to functionalize the metal nanoparticles microstructure, the subsequent sintering step is required to form a metal interconnect wire. Metal interconnect wire with fewer grain boundaries and fewer holes have excellent mechanical and electronic properties. In this paper, the pseudoplastic metal nanoparticle fluid was formed by Ag nanoparticle and precursor solution, and then the thermal diffusion process was completed by microwave sintering after interconnects were embossed. The influence of microwave and thermal atmosphere on the microstructure and performance of Ag Interconnect wires was analyzed and discussed, and the Ag Interconnect wires performance was determined under the influence of time and temperature parameters. In our experiments, the interconnects after microwave sintering can achieve 39% of the conductivity of bulk silver. The microwave sintering module might be integrated as the heat treatment module of the metal micro/nano pattern directly imprint lithography.

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Flexible devices fabricated by a plate-to-roll nanoimprint lithography system

Cited by 12 publications

References 24 publications

Broadband lightweight flat lenses for long-wave infrared imaging

Broadband lightweight flat lenses for long-wave infrared imaging

Deep plasmonic direct writing lithography with ENZ metamaterials and nanoantenna

Ag metal interconnect wires formed by pseudoplastic nanoparticles fluid imprinting lithography with microwave assistant sintering

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