1998
DOI: 10.1109/55.735751
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Flicker noise in GaN/Al/sub 0.15/Ga/sub 0.85/N doped channel heterostructure field effect transistors

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Cited by 54 publications
(26 citation statements)
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“…Details of the structure parameters and fabrication process have been reported by us earlier. 2,3 With these two types of devices, we were able to carry out a comparative flicker noise study and elucidate the effect of doping on the noise level. In addition, we have studied GaN transistors fabricated on sapphire substrate.…”
Section: Low-frequency Noise In Gan Transistorsmentioning
confidence: 99%
See 1 more Smart Citation
“…Details of the structure parameters and fabrication process have been reported by us earlier. 2,3 With these two types of devices, we were able to carry out a comparative flicker noise study and elucidate the effect of doping on the noise level. In addition, we have studied GaN transistors fabricated on sapphire substrate.…”
Section: Low-frequency Noise In Gan Transistorsmentioning
confidence: 99%
“…1 We have also shown that GaN HFETs grown on sapphire can operate with low flicker noise levels, which are required for the microwave applications, particularly low-phase noise amplifiers. [2][3] The flicker noise, which manifests itself at low-frequencies (usually 0.01 kHz-100 kHz) with the 1/f γ spectral density dependence, is an important figure-of-merit for semiconductor devices since this type of noise is the limiting phase-noise factor for all kinds of transistors (γ is a parameter close to 1).…”
Section: Introductionmentioning
confidence: 99%
“…The values of a reported for the AlGaN HEMT structures grown on SiC substrate were much smaller (a % 10 À4 ) [7]. More recently, small values of a were reported for AlGaN/GaN HFETs grown on sapphire substrates [8]. A systematic investigation of the structures grown on different substrates using the same growth and fabrication technology might help to clarify the low-frequency noise properties of the AlGaN/GaN HFETs.…”
mentioning
confidence: 97%
“…We have also shown that GaN HFETs grown on sapphire can operate with small low-frequency noise levels required for the microwave applications. 3 The Hooge parameter extracted for these devices was on the order of ␣ H Ϸ10 Ϫ5 -10 Ϫ4 which is comparable to the noise level in commercial GaAs devices.…”
mentioning
confidence: 68%