“…One dimensional (1-D) SiNWs have enhanced light absorption capability and received increasing research interest because of their higher surface-to-volume ratio, strong light trapping effect, fast charge transport, and high charge collection efficiency by shortening the carrier transport path in comparison to bulk Si. , Thus, changes in the length, diameter, and spacing of SiNWs developed after the etching process reveal improvement of material properties, such as light absorption and scattering, enhancement of surface built-in-field, , electron–hole recombination, quantum confinement, and so forth. This leads to the enhanced application in photodetectors, − photovoltaics high sensitivity sensors, , field-effect-transistors, , thermoelectric devices, super capacitors, and so on. Single-crystalline SiNWs can be synthesized via reactive-ion-etching (RIE) or vapor–liquid–solid (VLS) methods in gas phase and metal-assisted chemical etching (MACE) in the solution process.…”