Flow pattern defects in germanium-doped Czochralski silicon crystals

Xu, Wubing; Chen, Jiahe; Ma, Xiangyang; Yang, Deren; Gong, Lei; Tian, Dong

doi:10.1007/s00339-010-6146-6

Cited by 3 publications

(1 citation statement)

References 15 publications

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“…On the one hand, the particle distributions of the experimental CZ and NCZ polish wafers were tested using an SP2 device. On the other hand, the particle type (COPs or large dislocation particles (LDPs)) was tested using the flow pattern defect (FPD) technique [17,18] such that the samples were vertically immersed and etched in the Secco etchant (50%HF:0.15 mol/LK 2 Cr 2 O 7 = 2:1) after polishing treatment. The morphology of the FPDs was observed using an optical microscope.…”

Section: Cops and Fpds Analysis Of Polish Wafermentioning

confidence: 99%

Effects of Nitrogen Doping on Pulling Rate Range of Defect-Free Crystal in CZ Silicon

Sun,

Lou,

et al. 2023

Coatings

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We investigated the effect of nitrogen doping on the pulling rate range of defect-free crystal in silicon with a diameter of 200 mm. It was found that the pulling rate range of defect-free crystal in nitrogen-doped Czochralski silicon is wider and the pulling rate (defect free) is lower than it is in non-nitrogen-doped Czochralski silicon. Under the experiment, the pull rate was from 0.67 mm/min~0.58 mm/min to 0.65 mm/min~0.54 mm/min. To further confirm the above experimental analysis, a numerical simulation process of nitrogen-doped Czochralski and non-nitrogen-doped Czochralski in an industrial system was performed. The V/G value along the S/L interface was the same for both models, but the distribution of Cvi (concentration of vacancy–concentration of self-interstitial) for nitrogen-doped Czochralski crystal silicon was more uniform and flat in a nitrogen-doped single crystal. Furthermore, the nitrogen-doped Czochralski crystal silicon had a smaller void size and a higher oxygen precipitation density. The experimental results are in good agreement with the numerical simulation results.

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Section: Cops and Fpds Analysis Of Polish Wafermentioning

confidence: 99%