2009
DOI: 10.1117/1.3224950
|View full text |Cite
|
Sign up to set email alerts
|

Fluid-photoresist interactions and imaging in high-index immersion lithography

Abstract: Optical immersion lithography using fluids with refractive indices greater than that of water ͑1.436͒ can enable numerical apertures of 1.55 or above for printing sub-45-nm lines. Two second-generation immersion fluid candidates, IF132 and IF169, both have indices above 1.64 and have been optimized to absorb less than 0.1 cm −1 at 193.4 nm. These fluids, although meeting the requirements of index and absorption, must also be compatible with current resists and processes to image the required fine line patterns… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1

Citation Types

0
1
0

Year Published

2010
2010
2019
2019

Publication Types

Select...
5
1

Relationship

0
6

Authors

Journals

citations
Cited by 11 publications
(1 citation statement)
references
References 23 publications
0
1
0
Order By: Relevance
“…48,49 The per unit dose basis can be changed so that IAD can be calculated per full spectrum dose or per UVA-340 dose. Therefore IAD analysis is assumed to be independent of thickness.…”
Section: Induced Absorbance To Dosementioning
confidence: 99%
“…48,49 The per unit dose basis can be changed so that IAD can be calculated per full spectrum dose or per UVA-340 dose. Therefore IAD analysis is assumed to be independent of thickness.…”
Section: Induced Absorbance To Dosementioning
confidence: 99%