Fluorine Plasma Treatments of Poly(propylene) Films, 2 – Modeling Reaction Mechanisms and Scaling

Yang, Yang; Strobel, Mark; Kirk, Seth; Kushner, Mark J.

doi:10.1002/ppap.200900114

Cited by 27 publications

(10 citation statements)

References 58 publications

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“…In Part 2 of this paper,11 we report the results from an integrated plasma and surface kinetics model that was developed simultaneous with the reported experimental work to describe the reactions in the F 2 /Ar plasma treatment of a PP film surface.…”

Section: Introductionmentioning

confidence: 99%

Fluorine Plasma Treatments of Polypropylene Films, 1 – Surface Characterization

Kirk

Strobel

Lee

et al. 2010

Plasma Processes & Polymers

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a Part 2: cf. ref. [11] In this work, an experimental investigation of fluorine gas (F 2 ) plasma treatment of polypropylene (PP) film reveals the evolution of PP fluorination. Surface analysis of fluorinated PP surfaces describes a surface modification process that is initially quite rapid but slows sharply as the fluorination progresses. The fluorination reaction occurs more rapidly at the PP film surface and evidence of a treatment gradient is seen in the ESCA sampling depth of 10 nm. The increasingly fluorinated surface becomes less reactive to the plasma chemistry and develops a fully fluorinated, cross-linked surface layer that eventually extends the full ESCA sampling depth.

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Section: Introductionmentioning

confidence: 99%

Fluorine Plasma Treatments of Polypropylene Films, 1 – Surface Characterization

Kirk

Strobel

Lee

et al. 2010

Plasma Processes & Polymers

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“…Cold plasmas modification of polymers can change their physical and chemical surface characteristics . For example, Yang et al showed that affixing fluorine to a hydrocarbon surface can increase its hydrophobicity. Savoji et al observed changes in surface composition and drastic improvement in wettability.…”

Section: Plasma‐based Surface Treatmentmentioning

confidence: 99%

Hybrid and Fluid Modeling of Ion Activation Energy and Reactive Fluxes to Particulates Suspended in Air and Residing on Surfaces

Babaeva

2016

Plasma Processes & Polymers

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We report on a computational study of the intersection of plasma filaments in a dielectric barrier discharge with small particulates suspended in air or residing on surfaces. The relative location of the particle with respect to the streamer axis is important on plasma time scale considered in the paper. The particulates residing on the substrate surface are partially enveloped by the sheath formed beneath the filament and the substrate. Ion energies and fluxes incident on the particulate depend on dielectric properties of the underlying substrate materials.

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“…The model was developed by Kushner and his team. [23][24][25] It is composed of several modules and can be used to investigate the electron behavior (like non-local 26 and harmonic effects 27 ), the chemical characteristics (like the chemical composition 28 ) and the surface kinetics (like etching, deposition, and implantation 29 ). In this work, the three main modules are applied, i.e., the Fluid Kinetics Module (FKM), the Electron Energy Transport Module (EETM), and the Electromagnetic Module (EMM).…”

Section: Model Descriptionmentioning

confidence: 99%

Effects of feedstock availability on the negative ion behavior in a C4F8 inductively coupled plasma

Zhao

Gao

Wang

et al. 2015

Journal of Applied Physics

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In this paper, the negative ion behavior in a C 4 F 8 inductively coupled plasma (ICP) is investigated using a hybrid model. The model predicts a non-monotonic variation of the total negative ion density with power at low pressure (10-30 mTorr), and this trend agrees well with experiments that were carried out in many fluorocarbon (fc) ICP sources, like C 2 F 6 , CHF 3 , and C 4 F 8. This behavior is explained by the availability of feedstock C 4 F 8 gas as a source of the negative ions, as well as by the presence of low energy electrons due to vibrational excitation at low power. The maximum of the negative ion density shifts to low power values upon decreasing pressure, because of the more pronounced depletion of C 4 F 8 molecules, and at high pressure ($50 mTorr), the anion density continuously increases with power, which is similar to fc CCP sources. Furthermore, the negative ion composition is identified in this paper. Our work demonstrates that for a clear understanding of the negative ion behavior in radio frequency C 4 F 8 plasma sources, one needs to take into account many factors, like the attachment characteristics, the anion composition, the spatial profiles, and the reactor configuration. Finally, a detailed comparison of our simulation results with experiments is conducted. V

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Fluorine Plasma Treatments of Poly(propylene) Films, 2 – Modeling Reaction Mechanisms and Scaling

Cited by 27 publications

References 58 publications

Fluorine Plasma Treatments of Polypropylene Films, 1 – Surface Characterization

Fluorine Plasma Treatments of Polypropylene Films, 1 – Surface Characterization

Hybrid and Fluid Modeling of Ion Activation Energy and Reactive Fluxes to Particulates Suspended in Air and Residing on Surfaces

Effects of feedstock availability on the negative ion behavior in a C4F8 inductively coupled plasma

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