Flying plasmonic lens at near field for high speed nanolithography

Pan, Liang; Park, Yong Shik; Xiong, Yi; Ulin-Avila, Erick; Zeng, Li; Sun, Cheng; Bogy, David B.; Zhang, Xiang

doi:10.1117/12.848370

Cited by 4 publications

(1 citation statement)

References 16 publications

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“…wafer in just 2 min at a scanning speed of 10 ms À1 , that is to say, a high throughput 6.6 SPPs Direct Writing Nanolithographyof 30 wafer/h can be achieved. Recently, the same group integrated the lithography system with another plasmonic lens [101]. The metallic thin-film structure consisting of two concentric rings with an H-shaped aperture in their center is used as the plasmonic lens; 50 nm lines width can be resolved in the resist with the 355 nm laser beam illumination, at a speed of about 10 m/s.…”

Section: Spps Direct Writing Nanolithographymentioning

confidence: 99%

Super-Resolution Patterning and Photolithography Based on Surface Plasmon Polaritons

Liu

Duan

Peng

2013

Nanostructure Science and Technology

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With the developments of the nanoscale science and technology, the demand for fabrication of nanoscale patterns has been significantly increased. Photolithography has still been the most widely used microfabrication technique because of its ease of repetition, effective cost, and suitability for large-area fabrication. The diffraction limit, however, restricts single-exposure resolution to features with periods no smaller than half wavelength of the illuminating sources. To achieve nanometer feature sizes within the regime of diffraction physics, one straightforward method is to reduce the working wavelength by employing light sources of higher photon energy, such as extreme ultraviolet light (EUV), soft X-rays, or atomic wave packet [1][2][3][4]. The main drawbacks, however, are the drastic increase of complexity and cost for instrumentation and processing, including the developments of new sources, photoresist, and the optical components. Several alternative techniques, such as electron beam lithography [5][6][7][8][9], focused ion beam lithography [10][11][12][13][14], dip-pen lithography [15][16][17][18], and nanoimprint lithography [19][20][21][22], can also achieve nanoscale feature sizes; however, these methods require the introduction of a new infrastructure of tools, materials, and processing technologies, which costs huge expenses.Recently, a new photolithographic scheme, which is based on the unique properties of surface evanescent waves [23][24][25][26] or surface plasmon polaritons (SPPs) [27][28][29][30][31][32][33][34][35][36][37] induced at the interface between a metal and a dielectric material, to achieve sub-diffraction-limit nanopatterns was proposed and demonstrated. The wave vector of SPPs can be significantly larger than that of the free-space illuminating light at the same frequency, which results in extraordinary "optical frequency but X-ray wavelength" property. As a result, the resolution of this surface plasmon nanolithography can go far beyond the free-space diffraction limit of the light. Different versions of the implementation of the SPPs-based super-resolution nanolithography have been proposed and conducted both theoretically and experimentally in recent years, which all demonstrate that SPPs-based nanolithography has the potential to satisfy the requirements of high resolution, low cost, and high throughput simultaneously.

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Section: Spps Direct Writing Nanolithographymentioning

confidence: 99%

Super-Resolution Patterning and Photolithography Based on Surface Plasmon Polaritons

Liu

Duan

Peng

2013

Nanostructure Science and Technology

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Plasmonic Nanolithography: A Review

Xie

Wang

et al. 2011

Plasmonics

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Surface plasmon polaritons (SPPs) has attracted great attention in the last decade and recently it has been successfully applied to nanolithography due to its ability of beyond diffraction limit. This article reviews the recent development in plasmonic nanolithography, which is considered as one of the most remarkable technology for next-generation nanolithography. Nanolithography experiments were highlighted on the basis of SPPs effect. Three types of plasmonic nanolithography methods: contact nanolithography, planar lens imaging nanolithography, and direct writing nanolithography were reviewed in detail, and their advantages and shortages are analyzed and compared, respectively. Finally, the development trend of plasmonic nanolithography is suggested.

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Scalable maskless patterning of nanostructures using high-speed scanning probe arrays

Chen

Akella

et al. 2017

Nanoengineering: Fabrication, Properties, Optics, and Devices XIV

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Flying plasmonic lens at near field for high speed nanolithography

Cited by 4 publications

References 16 publications

Super-Resolution Patterning and Photolithography Based on Surface Plasmon Polaritons

Super-Resolution Patterning and Photolithography Based on Surface Plasmon Polaritons

Plasmonic Nanolithography: A Review

Scalable maskless patterning of nanostructures using high-speed scanning probe arrays

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