Plasmonic Nanolithography: A Review

Abstract

Surface plasmon polaritons (SPPs) has attracted great attention in the last decade and recently it has been successfully applied to nanolithography due to its ability of beyond diffraction limit. This article reviews the recent development in plasmonic nanolithography, which is considered as one of the most remarkable technology for next-generation nanolithography. Nanolithography experiments were highlighted on the basis of SPPs effect. Three types of plasmonic nanolithography methods: contact nanolithography, planar lens imaging nanolithography, and direct writing nanolithography were reviewed in detail, and their advantages and shortages are analyzed and compared, respectively. Finally, the development trend of plasmonic nanolithography is suggested.

Formation of Plasmonic Nanojets by Silver Nano-Strip

“…SPP can be widely used to solve various problems of modern science and technology [3][4][5][6][7]. A large number of works devoted to the modeling of nano-antennas, based on SPP's excitation effect [8][9].…”

Optical nanolithography with λ/15 resolution using bowtie aperture array

“…With the development of nanoscale science, nanofabrication technique needs to be continuously improved [1]. Higher resolution and throughput, lower cost, and simplification of system configuration are always the targets to pursue.…”

Multilayered Superlenses Containing CSBR or Active Medium for Subwavelength Photolithography

“…Superlenses built with ENG materials have been proposed in the optical or UV bands [3][4][5][6][7][8][9][10][11][12][13]. Surface plasmon polaritons (SPP's) can be excited around the interface between an ENG layer and a matching layer, the latter is usually made of a double-positive (DPS) material with the same | | as the ENG layer.…”

“…Alternatively, far-field superlenses (FSL), having a longer separation between the mask and the image plane to prevent mask damage, can also break the conventional diffraction limit [13][14][15][16]. For example, half-pitch of λ/8 has been resolved using the FSL [14].…”