Focused ion beam deposition of new materials: dielectric films for device modification and mask repair, and tantalum films for x-ray mask repair

Stewart, Diane K.; Doyle, Andrew F.; Casey, J. A.

doi:10.1117/12.209163

Cited by 16 publications

(11 citation statements)

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“…This paper introduces an alternative method to enhance surface smoothness combining the DRIE Bosch process with the focused ion beam (FIB) milling process. FIB has been widely employed in semiconductor research and processing environments for highly precise milling and deposition of conductors or insulators [13][14][15]. The FIB technique has also been reported in Si micromachining applications for performing unique and highly precise process on a relatively low scale, where the inherent slow FIB processing time is not an issue [16,17].…”

Section: Introductionmentioning

confidence: 99%

Smoothing dry-etched microstructure sidewalls using focused ion beam milling for optical applications

Song¹,

Peter²,

Meunier³

2007

J. Micromech. Microeng.

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This paper presents a new sidewall smoothing process for Si micro-optical components using focused ion beam (FIB) milling. First, the deep reactive ion etching (DRIE) Bosch process is employed to form a microstructure on a Si substrate. However, scalloping which is induced on the sidewall by the repetition of etching and passivation steps is a major source of light scattering, reducing surface reflectivity in optical applications. In this research, FIB is used to smooth the rough sidewall surface and obtain polished mirror surface. After the DRIE Bosch process, the values of sidewall roughness as measured by atomic force microscopy were 153.0 ± 13.5 nm with an rms value of 28.1 ± 6.4 nm. The FIB smoothing process tremendously improved the surface roughness of etched sidewalls resulting in a maximum peak-to-valley roughness and an rms roughness of 5.7 ± 1.8 nm and 1.6 ± 0.7 nm, respectively. In this paper, the DRIE Bosch process and the FIB smoothing process are described in detail and applications using this technique are discussed.

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Section: Introductionmentioning

confidence: 99%

Smoothing dry-etched microstructure sidewalls using focused ion beam milling for optical applications

Song¹,

Peter²,

Meunier³

2007

J. Micromech. Microeng.

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“…Focused ion beam (FIB) is widely used in solid-state integrated circuit failure analysis 1 2 and modification 3 4 5 . Recently, it also finds applications for high-precision machining in micro/nanoelectromechanical systems (MEMS/NEMS).…”

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confidence: 99%

Focused-Ion-Beam Induced Rayleigh-Plateau Instability for Diversiform Suspended Nanostructure Fabrication

Zhao

Mao

et al. 2015

Sci Rep

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A novel method for fabricating diversiform suspended nanostructures is reported. The method utilizes focused-ion-beam (FIB) induced material redistribution and Rayleigh-Plateau instability, which determine the resulting shapes of formed nanostructures. By choosing target materials, their predefined patterns as well as FIB settings, we have achieved parallel nanofabrication of various kinds including nanostrings, nanobead chains and nanopore membranes with smooth surfaces due to the self-perfection effect of the material redistribution upon the minimization of system free energy. The diameters of the nanostrings and nanopores reach about 10 nm and 200 nm, respectively. The average period of the nanobead chains is 250 nm.

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“…While the CO 2 laser technique described above can be used to fabricate a tip, it does not allow the tip parameters to be determined very precisely or repeatably. Focused ion beam (FIB) technology [ 33 , 34 , 35 ] can also be used to fabricate the fiber tip. FIB technology can support the micro-operations required to form the tip with high precision, such as localized milling and metal coating deposition.…”

Section: Tof Structures and Their Fabricationmentioning

confidence: 99%

A Review of Multimode Interference in Tapered Optical Fibers and Related Applications

Wang

Zhao

Wang

et al. 2018

Sensors

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In recent years, tapered optical fibers (TOFs) have attracted increasing interest and developed into a range of devices used in many practical applications ranging from optical communication, sensing to optical manipulation and high-Q resonators. Compared with conventional optical fibers, TOFs possess a range of unique features, such as large evanescent field, strong optical confinement, mechanical flexibility and compactness. In this review, we critically summarize the multimode interference in TOFs and some of its applications with a focus on our research project undertaken at the Optoelectronics Research Centre of the University of Southampton in the United Kingdom.

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Focused ion beam deposition of new materials: dielectric films for device modification and mask repair, and tantalum films for x-ray mask repair

Cited by 16 publications

References 0 publications

Smoothing dry-etched microstructure sidewalls using focused ion beam milling for optical applications

Smoothing dry-etched microstructure sidewalls using focused ion beam milling for optical applications

Focused-Ion-Beam Induced Rayleigh-Plateau Instability for Diversiform Suspended Nanostructure Fabrication

A Review of Multimode Interference in Tapered Optical Fibers and Related Applications

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