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Visualization of beams from ionic liquid ion sources for focused ion beam applications J. Vac. Sci. Technol. B 30, 06F601 (2012); 10.1116/1.4745187 Development and characterization of an iodine field emission ion source for focused ion beam applications High brightness inductively coupled plasma source for high current focused ion beam applications Beam emittance measurements of transformer coupled plasma ion source for focused ion beam Rev.

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Articles you may be interested inFocused helium and neon ion beam induced etching for advanced extreme ultraviolet lithography mask repair

We have observed focused ion beam (FIB) induced deposition of tungsten on vertical sidewalls. This phenomenon allows high aspect ratio structures such as deep holes to fill with greater efficiency than expected from yields measured when the ion beam is at normal incidence to the surface. However we have also observed indirect deposition on vertical sidewalls which face a clear defect (an area which is missing x-ray absorber) on an x-ray mask that had to be repaired by depositing x-ray absorbing material. Since tungsten is used for both IC microstructuring and x-ray mask repair, deposition on vertical sidewalls can be exploited for certain repair processes on these structures. However we also propose ways of reducing the effect when deposition distorts facing vertical sidewalls on x-ray masks.