Focused ion beam machining and deposition for nanofabrication

Davies, S. T.; Khamsehpour, B.

doi:10.1016/0042-207x(95)00235-9

Cited by 23 publications

(8 citation statements)

References 22 publications

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“…Since the milling rate for each pass is minute and fluctuant, and the repetitive passes are necessary for high-aspect-ratio structures, the ordinary way to use time duration or pass number to predict the depth of cut becomes impractical and inaccurate. Various techniques, including the use of absorbed sample current, photons (Yamaguchi et al 1998), secondary electrons (Davies and Khamsehpour 1996), secondary ions (Nojima et al 2002) and electric resistance of milled track (Latif et al 2000), have been developed for on-line depth detection with nanometer scale precision (Bischoff et al 2001). Davies and Khamsehpour (1996) studied the correlation between the absorbed current and the secondary electron as a function of the FIB dwell time and found that the detection accuracy can be significantly improved by reducing the dwell time.…”

Section: Microchannels With High Aspect Ratiomentioning

confidence: 99%

Recent developments in micromilling using focused ion beam technology

Tseng

2004

J. Micromech. Microeng.

365

223

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The application of focused ion beam (FIB) technology in microfabrication has become increasingly popular. Its use in microfabrication has advantages over contemporary photolithography or other micromachining technologies, such as small feature resolution, the ability to process without masks and being accommodating for a variety of materials and geometries. An overview of the recent development in FIB microfabrication technology is given. The emphasis will be on direct milling, or maskless techniques, and this can distinguish the FIB technology from the contemporary photolithography process and provide a vital alternative to it. After an introduction to the technology and its FIB principles, the recent developments in using milling techniques for making various high-quality devices and high-precision components at the micrometer scale are examined and discussed. Finally, conclusions are presented to summarize the reviewed work and to suggest the areas for improving the FIB milling technology and for future research.

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Section: Microchannels With High Aspect Ratiomentioning

confidence: 99%

Recent developments in micromilling using focused ion beam technology

Tseng

2004

J. Micromech. Microeng.

365

223

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“…Chang et al [164] demonstrated an efficient structural color printing filter based on plasmonic metasurfaces with a thin MIM stack. In order to avoid color crosstalk, holes on perforated Ag film were milled, through Focus Ion Beam (FIB) [165], in a hexagonal array. The design was further covered with a thin transparent polymer layer, PMMA.…”

Section: Nanoholesmentioning

confidence: 99%

Nanostructured Color Filters: A Review of Recent Developments

2020

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Color plays an important role in human life: without it life would be dull and monochromatic. Printing color with distinct characteristics, like hue, brightness and saturation, and high resolution, are the main characteristic of image sensing devices. A flexible design of color filter is also desired for angle insensitivity and independence of direction of polarization of incident light. Furthermore, it is important that the designed filter be compatible with the image sensing devices in terms of technology and size. Therefore, color filter requires special care in its design, operation and integration. In this paper, we present a comprehensive review of nanostructured color filter designs described to date and evaluate them in terms of their performance.

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“…Los haces iónicos focalizados se emplean también con otros propósitos, además de los descritos, sobre todo en el campo de la microelectrónica (11) y la micromecanización (12), ya que permite realizar implatación iónica selectiva, microlitografía, etc. En este estudio hemos puesto de manifiesto además que son una alternativa interesante para la preparación muestras TEM de interfases metal/cerámica.…”

Section: -Conclusionesunclassified

Estudio comparativo de técnicas de preparación de muestras para microscopía electrónica de transmisión de recubrimientos cerámicos proyectados por plasma

López¹,

Chiou²,

Faber³

2000

Bol. Soc. Esp. Ceram. Vidr.

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El desarrollo de materiales avanzados, con microestructuras cada vez más complejas, supone un reto constante de desarrollo y aplicación de técnicas que permitan el análisis de la microestructura de forma eficiente. En el caso de los recubrimientos cerámicos sobre substrato metálico, la diferente velocidad de adelgazamiento iónico que suelen mostrar ambos sistemas supone, en principio, una limitación sustancial. En este trabajo, presentamos un estudio comparativo de la fabricación de láminas delgadas para microscopía electrónica de transmisión, empleando en primer lugar una técnica derivada de la convencional (desbaste, pulido y adelgazamiento iónico), y alternativamente una novedosa técnica de ataque selectivo mediante un haz iónico. El material elegido para realizar este estudio ha sido un recubrimiento de óxido de aluminio de grano fino proyectado por el método de plasma sobre acero. Se discute la eficiencia de cada una de las técnicas, así como las carácteris-ticas microstructurales más destacadas en el material objeto de estudio.Palabras clave: recubrimientos, óxido de aluminio, acero, microestructura, microscopía electrónica de transmisión. Comparative study of TEM sample preparation techniques for plasma-sprayed ceramic coatingsThe development of advanced materials, with complex microstructures, is a permanent challenge to the development and application of new efficient techniques for microstructural characterization. In ceramic coatings on metals, there exist a differential ion-milling ratio between both components, limiting in principle the use of conventional techniques. In this work, we report on a comparative study of TEM sample preparation techniques for plasma-sprayed ceramic coatings. Firstly, we have used a procedure derived from the conventional one (polishing, dimpling, ion milling), and alternatively a new technique using focused ion-beam milling. The material selected for this study is fine-grained alumina that was plasmasprayed on a steel substrate. The efficiency of both techniques is discussed along with the most significant microstructural features of the material subject of study.Key words: coatings, alumina, steel, microstructure, transmission electron microscopy. 1.-INTRODUCCIÓNLos resultados de los estudios que emplean la técnica de microscopía electrónica de transmisión (TEM, siglas en inglés) para el análisis de materiales, dependen críticamente de la calidad de las láminas (1,2). En el caso de muestras que contienen intercaras metal/cerámica, es bien sabido que el principal reto de la preparación de láminas para TEM, es el diferente ritmo de adelgazamiento que presentan ambos tipos de sólidos ante el ataque iónico convencional.En fechas relativamente recientes, se ha desarrollado un sistema de adelgazamiento que permite el uso de un haz ióni-co focalizado (FIB, siglas en inglés), cuya intensidad y área de trabajo puede ser manipulada de forma precisa. Se espera que ello permita adecuar el trabajo de adelgazamiento a las características composicionales y morfológicas del material (3...

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Focused ion beam machining and deposition for nanofabrication

Cited by 23 publications

References 22 publications

Recent developments in micromilling using focused ion beam technology

Recent developments in micromilling using focused ion beam technology

Nanostructured Color Filters: A Review of Recent Developments

Estudio comparativo de técnicas de preparación de muestras para microscopía electrónica de transmisión de recubrimientos cerámicos proyectados por plasma

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