2015
DOI: 10.3762/bjnano.6.191
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Focused particle beam-induced processing

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Cited by 6 publications
(6 citation statements)
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“…Thus, the transition to isotropic vortex dynamics is steeper in T the smaller the pinning barrier is. However, although the general formulas ( 29), (32), and (34) for the experimentally accessible quantities include the angle and temperature dependences, for the presentation of the data we used α = 0 • and g ≡ U p /2T = 100 for the sake of simplicity.…”
Section: Discussionmentioning
confidence: 99%
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“…Thus, the transition to isotropic vortex dynamics is steeper in T the smaller the pinning barrier is. However, although the general formulas ( 29), (32), and (34) for the experimentally accessible quantities include the angle and temperature dependences, for the presentation of the data we used α = 0 • and g ≡ U p /2T = 100 for the sake of simplicity.…”
Section: Discussionmentioning
confidence: 99%
“…To summarize, the experimentally accessible values, namely the dc voltage, the contribution of the kω-harmonics in the ac response, and the absorbed ac power, are determined by equations ( 29), (32), and (34), respectively. Their behavior as functions of all driving parameters in the problem is analyzed next.…”
Section: Expressions For Experimentally Accessible Valuesmentioning
confidence: 99%
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“…Nanoscale fabrication is the central theme of modern technology, and electron beam methodologies are said to be one of the most versatile techniques. , In this context, focused electron beam induced deposition (FEBID) is a promising technique for a direct three-dimensional (3D) deposition of high-purity materials. The precursor material is deposited on a surface and is concomitantly decomposed under a focused beam of electrons in the energy range of kiloelectronvolts. During the FEBID process, both the primary particles and the secondary species, that is, ballistic low-energy (<50 eV) electrons, , act for the surface modification.…”
Section: Introductionmentioning
confidence: 99%
“…Focused particle beam processing is a novel technique, which is rapidly developing in the field of nanofabrication. A straightforward use of electron and ion beams for nanopatterning led to extensive studies of electron and ion beam interactions with substrate materials, which are now fairly well understood . The situation is different for beam-assisted deposition techniques where precursor molecules (often metal-containing) are introduced to the vicinity of a substrate by a gas-injection system.…”
Section: Introductionmentioning
confidence: 99%