Formation dynamics of SiO2 nanoparticles produced by laser ablation in ambient gases

Koike, Reiji; Suzuki, Ryoichi; Katayama, Keita; Higashihata, Mitsuhiro; Ikenoue, Hiroshi; Nakamura, Daisuke

doi:10.1007/s00339-022-06114-7

Cited by 1 publication

(1 citation statement)

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“…Moreover, SiO 2 is used as a dielectric material in microelectronic circuits. Several techniques have been used to deposit TiO 2 and SiO 2 thin films, including chemical vapor deposition (CVD) [ 7 , 8 ], molecular beam epitaxy [ 9 , 10 ], plasma-enhanced chemical vapor deposition [ 11 , 12 ], the sol–gel process [ 13 , 14 ], and pulsed laser deposition (PLD) [ 15 , 16 ], etc. PLD is a physical vapor deposition technique that uses high-energy laser pulses to ablate the target’s material to obtain, via vapor condensation on a substrate, thin films with excellent structural and optical properties.…”

Section: Introductionmentioning

confidence: 99%

Optical and Structural Analysis of TiO2–SiO2 Nanocomposite Thin Films Fabricated via Pulsed Laser Deposition Technique

et al. 2023

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TiO2–SiO2 nanocomposite thin films have gained the attention of the scientific community due to their unique physical and chemical properties. In this paper, we report on the fabrication and characterization of a TiO2–SiO2 nanocomposite disk-shaped target. The target was used for the deposition of TiO2–SiO2 nanocomposite thin films on fluorine-doped tin oxide/glass substrates using the pulsed laser deposition (PLD) technique. The thicknesses of the thin films were fixed to 100 nm, and the deposition temperature ranged from room temperature to 300 °C. As revealed by the microstructural and morphological characterizations revealed, the TiO2–SiO2 nanocomposite thin films are amorphous and display homogeneous distribution. The determined values of the indirect optical band gap range from 2.92 to 3.07 eV, while those of the direct optical band gap lie between 3.50 and 3.55 eV. Additionally, as the deposition temperature decreases, the light transmission increases in the visible and in the ultraviolet ranges, which is suitable for flexible perovskite solar cells. This research can uncover new insights into the fabrication of amorphous TiO2–SiO2-based nanostructured thin films using the PLD technique for perovskite solar cell technology.

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