2007
DOI: 10.1016/j.scriptamat.2007.03.052
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Formation mechanism of parallel twins related to Si-facetted dendrite growth

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Cited by 74 publications
(57 citation statements)
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“…The twins are therefore most likely a growth phenomenon rather than a deformation phenomenon, a conclusion also supported by energetic calculations [22]. Fujiwara et al [23] suggested ig. 5.…”
Section: Discussionmentioning
confidence: 67%
“…The twins are therefore most likely a growth phenomenon rather than a deformation phenomenon, a conclusion also supported by energetic calculations [22]. Fujiwara et al [23] suggested ig. 5.…”
Section: Discussionmentioning
confidence: 67%
“…Twins are well known to act as a source of steps. For example, the presence of at least two such twin planes can give rise to the twin plane re-entrant edge (TPRE) mechanism: growth on the re-entrant corners generates more re-entrant corners, thereby providing unlimited steps for interfacial attachment and detachment [18,19,68,69]. Thus, the rate of growth at the multiply twinned particle edges is limited by the rate at which solute atoms diffuse to the surface.…”
Section: Discussionmentioning
confidence: 99%
“…Thus, defects can play a critical role in providing the steps necessary for interfacial propagation. One example is the twin plane re-entrant edge (TPRE) mechanism for the growth of Si dendrites in the {1 1 2} direction [18,19]. Recently, Gamalski et al [20] suggested that the presence of the twin, by itself, does not reduce the barrier for nucleation of steps; rather, the barrier is effectively reduced by the line energy.…”
Section: Introductionmentioning
confidence: 99%
“…Figure 9 shows another model of parallel-twin formation at crystal-melt interface during crystal growth. When a twin boundary is accidentally formed on a (111)-facet plane, another twin boundary is formed parallel to the first twin after lateral growth is promoted [89,135]. Twin nucleation at TPB was observed [89,127,136,137].…”
Section: Defect Generation During Crystal Growthmentioning
confidence: 98%