Formation of Ag nanoparticles in Si (100) wafers by single and multiple low energy Ag ions implantation

Modrić-Šahbazović, Almedina; Novaković, M.; Popović, Maja; Schmidt, E.; Gazdic, Izet; Bibić, N.; Ronning, Carsten; Rakočević, Zlatko Lj.

doi:10.1016/j.surfcoat.2019.124913

Cited by 8 publications

(3 citation statements)

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“…The SPR peak positions vary from 829 to 1271 nm, and also the peak intensity increases continuously with increasing ion fluence. An increase in the absorption together with the shift of the SPR peak to higher wavelengths after increasing implantation fluence have been reported recently in the case of 60 or 75 keV Ag irradiated Si samples [22,26], where the shift in SPR position was associated with the formation of larger number of Ag nanoparticles as the ion fluence increases, although the average size of particles was not changed. Fig.…”

Section: Optical Characterization Of Silver Implanted Si Substratessupporting

confidence: 55%

“…For instance, for the fitting of unimplanted Si a two-layer model was used consisting of crystalline silicon with a thin native oxide layer on the top of the sample. The model for the implanted and annealed Si layers was based on the amorphous Si model represented as ion-induced amorphized silicon (a-Si) or composition of a-Si and silver phases using self-consistent Maxwell-Garnett effective medium approximation [26]. for Si samples irradiated with 75 keV Ag ions in the range of 1×10 13 -1×10 16 ions/cm 2 .…”

Section: Optical Characterization Of Silver Implanted Si Substratesmentioning

confidence: 99%

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Thermal annealing of Ag implanted silicon: Relationship between structural and optical properties

et al. 2020

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Low energy Ag ions were implanted into silicon and annealed at different temperatures in order to generate plasmonic active silicon hybrids. It was found that as the ion fluence of irradiation was increased, a monotonic decrease in the absorption spectra in the ultraviolet region occurs, due to amorphization and macrostructuring of the Si surface. At the same time, the optical spectra are characterized by a strong band after implantation presenting the contribution of the surface plasmon resonance (SPR) of Ag nanoparticles. After heat treatment at 500 and 600?C, the SPR peak shifts to lower wavelengths, as compared to as implanted samples, whereas the plasmon position shifts to higher wavelengths for annealing at 700?C. This observation can be explained by either an out-diffusion of Ag or by stress relaxation and recrystallization of silicon. [Project of the Serbian Ministry of Education, Science and Technological Development, Grant no. III 45005]

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Section: Optical Characterization Of Silver Implanted Si Substratessupporting

confidence: 55%

Section: Optical Characterization Of Silver Implanted Si Substratesmentioning

confidence: 99%

Thermal annealing of Ag implanted silicon: Relationship between structural and optical properties

et al. 2020

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“…[ 52,53 ] Obviously, the mentioned NP appearance process above is closely related to the implantation parameters (e.g., fluence, energy, and ion species), the annealing parameters (e.g., temperature, time, and atmosphere), and the matrix materials. [ 54–59 ] In general, the average size of NPs depends on the implanted fluence (normally larger than 10 16 ions cm −2 ), and the NP distribution lies on the implanted energy (range from tens of keV to several MeV). [ 60 ] The optimal annealing temperature (vary from 100 to 1000 °C) and time (tens of minutes to several hours) are strongly associated with the component of NPs and matrixes, in the meanwhile, different atmosphere shows disparate impact on the NP formation as well.…”

Section: Ion Beam Synthesis Of Nanoparticlesmentioning

confidence: 99%

Plasmonic Nanoparticles in Dielectrics Synthesized by Ion Beams: Optical Properties and Photonic Applications

Pang

et al. 2020

Advanced Optical Materials

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The zero‐dimensional metallic nanoparticles (NPs) have attracted tremendous attention in various areas owing to the collective oscillation of electron gas that couples with electromagnetic field, known as localized surface plasmon resonance (LSPR). In practical applications, the tailoring of LSPR effect is of significant importance for promising photonic devices with designed nanocomposite systems and enhanced optical properties. Ion beam technology has been demonstrated to be an efficient method to fabricate NPs embedded in dielectrics for LSPR tailoring and material modification. By manipulating the parameters of ion beams, the shape, size, and structure of NPs can be well controlled, which enables the dielectrics to possess novel linear and nonlinear optical properties. In this review, the latest research progress on the ion beam synthesis of various NPs is systematically summarized. The tailoring of linear and nonlinear optical properties of dielectrics by NPs is discussed in detail. Selected applications are presented to indicate the development of the plasmonic NPs in dielectric systems for photonic applications.

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Anisotropic process of Ag nanoparticles embedding into c-Si during high-temperature annealing

Zharova,

Ermina,

Solodovchenko

et al. 2025

Applied Surface Science

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Formation of Ag nanoparticles in Si (100) wafers by single and multiple low energy Ag ions implantation

Cited by 8 publications

References 46 publications

Thermal annealing of Ag implanted silicon: Relationship between structural and optical properties

Thermal annealing of Ag implanted silicon: Relationship between structural and optical properties

Plasmonic Nanoparticles in Dielectrics Synthesized by Ion Beams: Optical Properties and Photonic Applications

Anisotropic process of Ag nanoparticles embedding into c-Si during high-temperature annealing

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