1982
DOI: 10.1116/1.571808
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Formation of alternative surface oxide phases on GaAs by adsorption of O2 or H2O: A UPS, XPS, and SIMS study

Abstract: Adsorption of O2 and H2O on GaAs exhibits a sharp contrast in behavior: O2 bonds to As sites almost exclusively while H2O predominantly bonds to Ga sites. The formation of Ga–OH bonds due to dissociative adsorption of H2O preceded by a molecular adsorption step is inferred from UPS data. Corroboration of these findings is provided by SIMS data for positive Ga and negative As ions. The role of hydrogen is discussed in the formation of stable oxides on the GaAs surface.

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Cited by 41 publications
(36 citation statements)
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“…As presented in the section of Introduction, the experimental results are different due to different GaAs surfaces and experimental conditions [6][7][8][9][10][11][12][13][14]. Chung et al [13] studied the reaction mechanism of the H 2 O molecule with the GaAs(1 0 0)-(4 Â 2) surface.…”
Section: Comparisons With the Experimental Resultsmentioning
confidence: 97%
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“…As presented in the section of Introduction, the experimental results are different due to different GaAs surfaces and experimental conditions [6][7][8][9][10][11][12][13][14]. Chung et al [13] studied the reaction mechanism of the H 2 O molecule with the GaAs(1 0 0)-(4 Â 2) surface.…”
Section: Comparisons With the Experimental Resultsmentioning
confidence: 97%
“…The corresponding adsorption and decomposition mechanisms were elucidated experimentally and theoretically [4,5]. As to the interactions of H 2 O with the GaAs surfaces, different mechanisms were obtained with different GaAs surfaces and experimental conditions [6][7][8][9][10][11][12][13][14]. The dissociation of H 2 O on the GaAs surface was found due to the formation of the Ga-O bond [7,[11][12][13][14].…”
Section: Introductionmentioning
confidence: 99%
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“…14, 15 We attribute the component at a binding energy of 1118.2 eV to a Ga-S bonding state resulting from the sulfidization of the GaSb surface. The Sb 4d spectra were deconvoluted into the Ga-Sb bond in GaSb ͑31.7 eV͒, the Sb-O bond in Sb 2 O 3 ͑34.7 eV͒, and the Sb-Sb bond in elemental Sb ͑31.9 eV͒, with a spin-orbit splitting of 1.25 eV and a new peak at a binding energy of 33.2 eV is attributed to Sb-S species on the passivated surface.…”
mentioning
confidence: 99%
“…As a result, an aqueous processing leads to a high density of Ga-OH groups on the surface. 21 The use of anhydrous benzene as a passivation medium can limit or eliminate the growth of such surface oxide. 22 The increased PL intensity was consistently observed from the GaSb samples treated by S, Se, or Te in the nonaqueous medium.…”
Section: A Surface Electronic and Chemical Propertiesmentioning
confidence: 99%