2020
DOI: 10.1016/j.vacuum.2019.108937
|View full text |Cite
|
Sign up to set email alerts
|

Formation of C3N4 thin films through the stoichiometric transfer of the bulk synthesized gC3N4 using RFM sputtering

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1
1
1

Citation Types

0
4
0

Year Published

2021
2021
2024
2024

Publication Types

Select...
5
1
1

Relationship

0
7

Authors

Journals

citations
Cited by 10 publications
(4 citation statements)
references
References 49 publications
0
4
0
Order By: Relevance
“…Compared with Nafion, the g−CN film blended by PEDOT-PSS showed superior PEC activities because the PEDOT-PSS binder is a wonderful conducting polymer and can act as a hole-transport layer. Recently, Tejasvi et al [ 95 ] synthesized stoichiometric g−CN thin films by radio frequency magnetron sputtering using a g−CN pellet as a target. Thin-film samples can be deposited on the borosilicate glass and TiO 2 nanotube array in Ar and N 2 plasma media.…”
Section: G−cn Thin-film Preparation Methodsmentioning
confidence: 99%
See 1 more Smart Citation
“…Compared with Nafion, the g−CN film blended by PEDOT-PSS showed superior PEC activities because the PEDOT-PSS binder is a wonderful conducting polymer and can act as a hole-transport layer. Recently, Tejasvi et al [ 95 ] synthesized stoichiometric g−CN thin films by radio frequency magnetron sputtering using a g−CN pellet as a target. Thin-film samples can be deposited on the borosilicate glass and TiO 2 nanotube array in Ar and N 2 plasma media.…”
Section: G−cn Thin-film Preparation Methodsmentioning
confidence: 99%
“…Some other ex situ methods have also been developed to fabricate g−CN electrodes successfully, including anodic aluminum oxide (AAO) membrane deposition [90], direct growth [61], vacuum filtration deposition [91,92], electrospinning (ESP) [77], vacuum magnetic filtered arc ion plating (VMFAIP) [93], ionothermal (molten salt) deposition [94], radio frequency magnetron (RFM)−based sputtering [95], and so on. A microcontactprinting process was reported by Liu et al, who fabricated g−CN nanostructures by injecting cyanamide into an anodized aluminum oxide (AAO) membrane sandwiched between two substrates and subsequently calcinating at 550 • C for 4 h (Figure 8a).…”
Section: Other Deposition Methodsmentioning
confidence: 99%
“…However, this is a multiparameter process. e reactive sputtering process involves the use of a high purity target and plasma medium [52].…”
Section: Synthesis Of G-cnmentioning
confidence: 99%
“…[33,116,122] Very recently, an original sputtering method using radio frequency magnetron (RFM) was used for the stoichiometric growth of photoactive C 3 N 4 thin films. [123] This method utilizes g-C 3 N 4 powder in the compact form to serve as the sputtering target. The thin-film deposition was carried out on different substrates, including borosilicate glass and TiO 2 nanotubular array, under two different plasma media, i.e., Ar and N 2 at various time durations.…”
Section: C3n4-based Thin Filmsmentioning
confidence: 99%