2005
DOI: 10.1116/1.1924471
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Formation of chalcogen containing plasmas and their use in the synthesis of photovoltaic absorbers

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Cited by 10 publications
(7 citation statements)
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“…For example, the chemical potential of atomic S is ∼3 eV greater than that for H 2 S. Such plasmas have previously been applied for converting In, Cu−In, and Cu−In− Ga to their respective chalcopyrite phases. 9 We are aware of one previous report of subliming elemental S into an Ar plasma for conversion of iron films into pyrite, but the materials chemistry was not fully described. 10 One drawback of using elemental Fe as a precursor is that the transformation proceeds through intermediate Fe 1−x S phases.…”
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confidence: 99%
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“…For example, the chemical potential of atomic S is ∼3 eV greater than that for H 2 S. Such plasmas have previously been applied for converting In, Cu−In, and Cu−In− Ga to their respective chalcopyrite phases. 9 We are aware of one previous report of subliming elemental S into an Ar plasma for conversion of iron films into pyrite, but the materials chemistry was not fully described. 10 One drawback of using elemental Fe as a precursor is that the transformation proceeds through intermediate Fe 1−x S phases.…”
mentioning
confidence: 99%
“…A rf power of 80 W was applied, which was previously shown to be sufficient to dissociate nearly all the H 2 S feed. 9 Further details on the exposure procedure are provided in the Supporting Information.…”
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“…The cracked Se atoms became Se radicals, which are more active than the Se molecules. 28,31,32 Therefore, Se radicals can accelerate the chemical reaction for the formation of MoSe 2 at a relatively low selenization temperature, and the selenization reaction becomes more complete as the plasma power increases. Consequently, the MoSe 2 HNRAs can be formed on the substrate under an ICP power of 350 W with a reaction time of 20 min and a reaction temperature of 300 °C.…”
Section: Resultsmentioning
confidence: 97%
“…In the plasma, molecular H 2 S are dissociated into atoms, excited metastables (S*), and ions (S + , S − ) by high‐energy electron bombardment, and these dissociated species are highly energetic and reactive. Therefore the H 2 S plasma has been previously employed to effectively sulfurize metals and oxides into metal sulfides, although the detailed sulfurization mechanism is still unclear and presumably complicated. The introduction of the H 2 S plasma in each ALD cycle (Figure b) can be regarded, equivalently, as an additional in situ sulfurization step after the normal molecular H 2 S dose.…”
Section: Atomic Layer Deposition Of Metal Pyritesmentioning
confidence: 99%