Formation of compounds by metalloid ion implantation in iron

Hohmuth, K.; Rauschenbach, B.; Kolitsch, A.; Richter, E.

doi:10.1016/0167-5087(83)90808-6

Cited by 87 publications

(4 citation statements)

References 24 publications

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“…Additional strengthening mechanisms become effective at high doses, which are associated with the formation of boride compounds. Fe2B and other borides of iron are also formed (Hohmuth et al 1983). By XPS analysis we observe that B20 3, Fe2B and CrB 2 compounds with some amounts of chromium oxides have been formed in the implanted layer as discussed earlier.…”

Section: ~00supporting

confidence: 70%

Surface composition and near-surface hardness studies on high dose boron-implanted 304 stainless steel

et al. 1990

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The modification of boron-implanted near surface of 304 stainless steel having strained and strain-free surfaces was studied. The energy of the boron ion was 130 keV at a dose of 2.5 x 1017 ions cm-z. Ion-implantation is known to modify the tribological properties of metals, however, it is not well-understood as to how such a shallow implanted layer can affect the microhardening. A full understanding of the process involved is yet to emerge. In the present work the ion implanted layer was characterized for boron depth profiles using AES and XPS. The implanted layer is observed to contain B/t3, Fe2B, FeB and CrBz compounds with small fractions of chromium and iron oxides. The strain-free surface of 304 SS shows an increase in microhardness by ~ 8070 after boron ion implantation at 2 gf and the strained surface by ~ 30~ at the same load. The annealing effects on microhardness for mechanically polished and implanted samples were also investigated in the temperature range 100 to 400°C. The possible correlation of near-surface microhardness increase with boride formation is discussed.

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Section: ~00supporting

confidence: 70%

Surface composition and near-surface hardness studies on high dose boron-implanted 304 stainless steel

et al. 1990

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“…Fujihana et al [30] also reported this metastable structure by ion implantation of C into chromium. The atomic ratio of carbon to chromium is about 0.6, therefore C implantation into Cr should basically cause the amorphization as suggested by Hohmuth et al [31]. Fujihana et al reported the formation of FCC carbide at doses >5 Â 10 17 ion/cm 3 and attributed this to a martensitic transformation from BCC Cr to FCC carbide induced by carbon implantation.…”

Section: Microstructural Characterizationmentioning

confidence: 87%

Cr-diamondlike carbon nanocomposite films: Synthesis, characterization and properties

2005

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“…This is called ion implantation (65)(66)(67)(68)(69)(70)(71)(72)(73)(74)(75)(76)(77). This is called ion implantation (65)(66)(67)(68)(69)(70)(71)(72)(73)(74)(75)(76)(77).…”

Section: Ion Implantationmentioning

confidence: 99%