“…While, a large number of full-Heusler alloy thin films have been grown on semiconductors like Si, 14 Ge, 15 and GaAs; 16 there are few reports on the films grown on oxide substrates such as Al 2 O 3 , 17,18 MgO 18-20 and SrTiO 3 . 21,22 Various deposition techniques such as laser ablation, 16,18,19,[21][22][23] sputtering [24][25][26][27] and molecular beam epitaxy 28 are in use for the growth of such films under varying conditions of growth. It is well-known that the choice of the deposition temperature, growth conditions, and substrates can significantly alter the structural, magnetic, and electronic properties of thin films.…”