1992
DOI: 10.4139/sfj.43.324
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Formation of Lead Film by Electroless Plating.

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Cited by 9 publications
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“…Lead. The deposition of thick Pb films via a conventional EL process has been described by Senda et al 653 using a pH 9 bath comprising PbCl 2 , the ligands Na 3 citrate, NTA, and Na 2 EDTA, and TiCl 3 as a reducing agent. Pb deposits at a rate of 520 Å•min −1 at 60 °C on substrates catalyzed by Pd/Sn colloid.…”
Section: Acs Applied Electronic Materialsmentioning
confidence: 99%
“…Lead. The deposition of thick Pb films via a conventional EL process has been described by Senda et al 653 using a pH 9 bath comprising PbCl 2 , the ligands Na 3 citrate, NTA, and Na 2 EDTA, and TiCl 3 as a reducing agent. Pb deposits at a rate of 520 Å•min −1 at 60 °C on substrates catalyzed by Pd/Sn colloid.…”
Section: Acs Applied Electronic Materialsmentioning
confidence: 99%