“…In other systems, the epoxy prepolymer and the block copolymer can provide a homogeneous solution before curing, but during the curing process the nanostructure can form through a mechanism called reaction-induced microphase separation [9]. Some examples of the copolymers that give rise to nanoscopic structures include diblocks and/or triblocks of poly(ethylene oxide) with polycaprolactone (PEO-b-PCL) [9], poly(propylene oxide) (PEO-b-PPO) [10][11][12][13][14][15], poly(hexylene oxide) (PEO-b-PHO) [16], poly(n-butylene oxide) (PBO-b-PEO) [17], poly(ethyl ethylene) (PEO-b-PEE) [7,8], poly(ethylene-alt-propylene) (PEO-b-PEP) [7,8,[18][19][20][21], low molar mass polyethylene (PEO-b-PE) [22], polystyrene (PEO-b-PS) [23], and polydimethylsiloxane (PEO-b-PDMS) [24]; block copolymers of polycaprolactone with polydimethyl-siloxane (PCL-b-PDMS-b-PCL) [25,26], poly(n-butyl acrylate) (PCL-b-PBA) [27], polybutadiene(PCLb-PBD-b-PCL) [28], polystyrene (PCL-b-PS) [29], or poly(butadiene-co-acrylonitrile) (PCL-b-PBN-b-PCL) [30]; block copolymers of poly(methyl methacrylate) with polystyrene (PMMA-b-PS) [31,32], and ABC-type triblock copolymer composed of polystyrene-b-polybutadiene-b-poly(methyl methacrylate) (PS-b-PBD-b-PMMA) [33,34], and polydimethyl-siloxane-b-polycaprolactone-b-polystyrene (PDMS-b-PCL-b-PS) [35]. The formation of ordered nanostructures in these epoxy networks occurs because the PCL, PEO or PMMA block segments in these corresponding copolymers remain miscible with the epoxy matrix after curing, whereas the other immiscible block components separate out.…”