Formation of TiO2 nanopattern using reverse imprinting and sol-gel method

Yoon, Kyung Min; Yang, Ki Yeon; Lee, Heon; Kim, Hyeong Seok

doi:10.1116/1.3246394

Cited by 17 publications

(12 citation statements)

References 19 publications

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“…In detail, laser-beam lithography, nanoimprint, and electron-beam methods fabricated TiO 2 lines on substrates. [7][8][9][10] Furthermore, dry etching process with photolithography formed controlled microfabricated TiO 2 patterns. 11 However, there has been no report for the TiO 2 channel waveguide of which the optical property has been evaluated.…”

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confidence: 99%

Development of microfabricated TiO2 channel waveguides

et al. 2011

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An optical channel waveguide is a key solution to overcome signal propagation delay. For the benefits of miniaturization, development of microfabrication process for waveguides is demanded. TiO2 is one of the suitable candidates for the microfabricated waveguide because of the high refractive index and the transparency. In the present study, conventional microfabrication processes manufactured TiO2 channel waveguides with 1-20 μm width on oxidized Si substrates and the propagation loss was measured. The prepared channels successfully guided light of 632.8 nm along linear and Y-branched patterns. The propagation loss for the linear waveguide was 9.7 dB/cm

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confidence: 99%

Development of microfabricated TiO2 channel waveguides

et al. 2011

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“…The soft stamp is then placed in contact with the resist and put under pressure. The nano-imprint process was used here with a TiO 2 sol-gel resist, which was deposited by spincoating at 5500 rpm on the scintillator surface before being patterned via nanoimprint [34][35][36][37][38]. The patterned layer is then annealed at a temperature optimized to match the required height and refractive index (n = 2.15).…”

Section: Coating Fabricationmentioning

confidence: 99%

Light Extraction Enhancement Techniques for Inorganic Scintillators

et al. 2021

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Scintillators play a key role in the detection chain of several applications which rely on the use of ionizing radiation, and it is often mandatory to extract and detect the generated scintillation light as efficiently as possible. Typical inorganic scintillators do however feature a high index of refraction, which impacts light extraction efficiency in a negative way. Furthermore, several applications such as preclinical Positron Emission Tomography (PET) rely on pixelated scintillators with small pitch. In this case, applying reflectors on the crystal pixel surface, as done conventionally, can have a dramatic impact of the packing fraction and thus the overall system sensitivity. This paper presents a study on light extraction techniques, as well as combinations thereof, for two of the most used inorganic scintillators (LYSO and BGO). Novel approaches, employing Distributed Bragg Reflectors (DBRs), metal coatings, and a modified Photonic Crystal (PhC) structure, are described in detail and compared with commonly used techniques. The nanostructure of the PhC is surrounded by a hybrid organic/inorganic silica sol-gel buffer layer which ensures robustness while maintaining its performance unchanged. We observed in particular a maximum light gain of about 41% on light extraction and 21% on energy resolution for BGO, a scintillator which has gained interest in the recent past due to its prompt Cherenkov component and lower cost.

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“…Reverse NIL can also fabricate nano-patterns with functional materials directly by using a soft mold and a functional resist. Our group developed a reverse NIL process using a h-PDMS and TiO 2 sol to fabricate 50-nm-sized nanopatterns [100]. An ethanol-based TiO 2 sol was synthesized by mixing tetrabutylorthotitanate precursor and diethanolamine in ethanol.…”

Section: -P5mentioning

confidence: 99%

Recent progress in direct patterning technologies based on nano-imprint lithography

Byeon

Lee

2012

Eur. Phys. J. Appl. Phys.

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Abstract. Nano-imprint lithography (NIL) is one of the most promising patterning technologies, in which nano-and micro-patterns are fabricated on various substrates. NIL provides high throughput and low cost in fabricating nano-structures due to its simple process and allows resolution below 10 nm without issues of light diffraction with conventional lithographic techniques. Its patterning mechanism is based on mechanical deformation of a polymer resist, which is simply done by pressing with a mold. This patterning mechanism also enables inorganic and organic-inorganic hybrid materials to be directly patterned by NIL. This article covers the recent progress of NIL-based direct patterning techniques and their applications to devices. Recently, functional nano-and micro-patterns have been applied to various electronic devices for the enhancement of overall performance. Fabrication methods of these devices are difficult using conventional lithographic techniques due to complex processes, high cost and low throughput. Direct NIL technique using functional resist can simply fabricate functional nano-and micro-structures and thus can be usefully applied to various industries.

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Formation of TiO2 nanopattern using reverse imprinting and sol-gel method

Cited by 17 publications

References 19 publications

Development of microfabricated TiO2 channel waveguides

Development of microfabricated TiO2 channel waveguides

Light Extraction Enhancement Techniques for Inorganic Scintillators

Recent progress in direct patterning technologies based on nano-imprint lithography

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