Formation of uniform self-assembly monolayers by choosing the right solvent: OTS on silicon wafer, a case study

Manifar, Touraj; Rezaee, Asad; Sheikhzadeh, M.; Mittler, Silvia

doi:10.1016/j.apsusc.2008.01.100

Cited by 40 publications

(54 citation statements)

References 54 publications

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“…At this purity, the effect of moisture on the polymerization of silanes in our experiments was minimal, but not negligible. [61] OTS SAM preparation Silicon wafers and SG-11 glass substrates were cleaved into pieces of 1 cm × 2 cm. Before the silanization process, substrates were first cleaned by ultra-sonication in a 2% solution of Hellmanex (Hellma, Germany), acetone, and MilliQ water (Milli-Q, ρ ≥ 18 M cm, Millipore) each for 5 min and rinsed five times with MilliQ water between each step.…”

Section: Methodsmentioning

confidence: 99%

“…We have previously shown the effects of solvent nature, partial charge distribution, and polarity index on the preparation of uniform OTS SAMs. [61] The present work focuses on two additional parameters: assembly time and baking temperature. Along with contact angle measurements, ellipsometry, and XPS; imaging techniques such as SEM and atomic force microscopy (AFM) were used to topographically study the OTS SAM formation.…”

Section: Introductionmentioning

confidence: 99%

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Octadecyltrichlorosilane (OTS): a resist for OMCVD gold nanoparticle growth

Rezaee

Davidson

Manifar

et al. 2009

Surface & Interface Analysis

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One application of octadecyltrichlorosilane (OTS) self-assembled monolayers (SAMs) is its use as thin film resists. In this work, we demonstrated that OTS SAMs can be reliable resists for organo-metallic chemical vapor deposition (OMCVD) grown gold nanoparticles (Au NPs). In optical sensing applications based on Au NPs, one candidate system consists of patterned OTS SAMs and precisely grown OMCVD Au NPs for achieving a high sensitivity. As an initial step, the OTS SAMs need to perfectly resist the OMCVD Au NP growth. Hence the optimized formation of the OTS SAMs affected by different assembly times and baking temperatures was studied by contact angle, ellipsometry, XPS, SEM, and atomic force microscopy (AFM). To demonstrate the ability of the OTS SAMs to resist OMCVD Au NP growth, the OMCVD process was carried out on two sets of samples: OTS SAMs fabricated under optimized conditions on one set and the other set without OTS SAMs. High-resolution XPS, RBS, SEM, and ultraviolet-visible (UV-Vis) spectroscopy were applied to study the growth of Au NPs on the samples with and without OTS SAM resists.

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Section: Methodsmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Octadecyltrichlorosilane (OTS): a resist for OMCVD gold nanoparticle growth

Rezaee

Davidson

Manifar

et al. 2009

Surface & Interface Analysis

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“…An organosilane molecule basically consists of 3 parts (i) surface-reactive head group (-OR), which covalently attaches to surface silanol groups (-SiOH) via siloxane (Si-O-Si) bond formation, (ii) alkyl chain, serves as hydrocarbon chain spacer and (iii) terminal group (X) that imparts functionality to a silica surface. Although this process seems to be a simple reaction, but the actual process is very complex due to complications of uncontrolled reactions and its sensitivity to reaction conditions such as temperature, moisture percentage, type of solvent, reaction time, concentration and solution age [2,[7][8][9][10]. Zisman et al reported the existence of threshold temperature (Tc) above which the formation of SAM gets completely inhibited.…”

Section: Introductionmentioning

confidence: 97%

Kinetic studies of attachment and re-orientation of octyltriethoxysilane for formation of self-assembled monolayer on a silica substrate

Hasan

Pandey

2016

Materials Science and Engineering: C

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“…SPM cleaned substrates were immersed in this solution for 1 h under nitrogen atmosphere to prevent polymerization of the OTS, after which they were rinsed using toluene, ethanol, and Milli‐Q water. The OTS treated substrates were blown dry using nitrogen and cured in a laboratory furnace at 100 °C for 10 h 22. The gold NPs (section 2.1) were deposited onto these OTS modified native silicon oxide (1.2 nm)/silicon wafers by spincoating (Polos spincoater) at a rotation speed of 3000 rpm during 30 s and an acceleration of 1500 rpm/s.…”

Section: Methodsmentioning

confidence: 99%

Deposition of functionalized gold nanoparticles onto modified silicon substrates

Riskin

Dobbelaere

Elen

et al. 2010

Physica Status Solidi (a)

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In this report, an existing phase transfer method for the synthesis of alkylamine-or alkanethiol-functionalized gold nanoparticles (NPs) is investigated. A parameter study shows that the concentration of the gold salt used is important for the stability of the resulting sol, but has little effect on the final average particle size or the size distribution. By adding dodecanethiol before the reduction, the formation of NPs was inhibited, providing evidence for the autocatalytic pathway for the formation of metallic NPs in wet chemical synthesis proposed in the literature. The resulting functionalized gold NPs are deposited onto Si-OH, octadecyltrichlorosilane (OTS) or 3mercaptopropyltrimethoxysilane modified SiO 2 /Si substrates. scanning electron microscope (SEM) is used to analyze the ordering behavior and surface coverage of the NPs and it is shown that the difference in affinity for the substrate has a profound effect on the deposition behavior. The functionalization of the substrates and of the NPs is confirmed by grazing angle attenuated total reflectance fourier transform infrared spectroscopy (GATR-FTIR).

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Formation of uniform self-assembly monolayers by choosing the right solvent: OTS on silicon wafer, a case study

Cited by 40 publications

References 54 publications

Octadecyltrichlorosilane (OTS): a resist for OMCVD gold nanoparticle growth

Octadecyltrichlorosilane (OTS): a resist for OMCVD gold nanoparticle growth

Kinetic studies of attachment and re-orientation of octyltriethoxysilane for formation of self-assembled monolayer on a silica substrate

Deposition of functionalized gold nanoparticles onto modified silicon substrates

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