2018
DOI: 10.1016/j.mee.2018.01.005
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Forming-free resistive switching characteristics in tantalum oxide and manganese oxide based crossbar array structure

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Cited by 24 publications
(15 citation statements)
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“…The resistive switching (RS) phenomenon is considered to be the reason behind this change of resistance values in a RRAM cell. An as-prepared RRAM is initially in the high resistance state (HRS), to switch the device from the HRS to the LRS, the application of the high voltage pulse enables the formation of conductive paths in the switching layer and the RRAM cell is switched into a LRS [72]. This process which occurs due to the soft breakdown of the metal insulator metal (MIM) structure is usually referred to as 'electroforming' and the voltage at which this process occurs is referred to as forming voltage (V f ).…”
Section: Resistance Switching Modesmentioning
confidence: 99%
“…The resistive switching (RS) phenomenon is considered to be the reason behind this change of resistance values in a RRAM cell. An as-prepared RRAM is initially in the high resistance state (HRS), to switch the device from the HRS to the LRS, the application of the high voltage pulse enables the formation of conductive paths in the switching layer and the RRAM cell is switched into a LRS [72]. This process which occurs due to the soft breakdown of the metal insulator metal (MIM) structure is usually referred to as 'electroforming' and the voltage at which this process occurs is referred to as forming voltage (V f ).…”
Section: Resistance Switching Modesmentioning
confidence: 99%
“…During the final scan (from 6 V to 0 V, the black curve in Figure 5 a), the device returns to its original state, which was assigned as “Rewrite” [ 41 ]. The two-stage current changes (e.g., sudden spike and drop) are typically referred to as “SET” and “RESET”, respectively [ 42 , 43 ]. Thus, the ITO/PF-BBO/Al device demonstrated rewritable electrical characteristics, which could also be interpreted as the flash-type ternary nonvolatile storage behavior.…”
Section: Resultsmentioning
confidence: 99%
“…Metal oxides are typical inorganic interlayers, and a vast amount of electrode interlayer combinations was probed. Bipolar ReRAM devices were achieved, for instance, based on Pd/HfO x -Ag NPs/TiN [125], or Ag/MnO-Ta 2 O 5 /Pt [126].…”
Section: Electronic Flexible Devices Based On Other Oxidesmentioning
confidence: 99%