Fowler-Nordheim Current Oscillations Analysis of Metal/Ultra-Thin Oxide/Semiconductor Structures

Khlifi, Yamina; Kassmi, K.; Roubi, L.; Maimouni, R.

doi:10.1002/1521-396x(200012)182:2<737::aid-pssa737>3.3.co;2-y

Search citation statements

Order By: Relevance

Paper Sections

Select...

Introduction1

Citation Types

Supporting

Mentioning

Contrasting

Year Published

2009

Publication Types

Select...

Article1

Relationship

Self Cite0

Independent1

Authors

Journals

Cited by 1 publication

(1 citation statement)

References 0 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…One-dimensional (1-D) and quasi–1-D nanostructures, due to their high crystal quality, large aspect ratio and sharp tips are well known as promising candidates for applications related to cold cathode, field emission of electrons [ 1 ]. Field emission—also called Fowler–Nordheim tunneling [ 2 ]—is a form of quantum tunneling in which electrons pass through a barrier in the presence of a high electric field. This phenomenon is highly dependent on both the structural properties of materials and the shape of particular cathode.…”

Section: Introductionmentioning

confidence: 99%

Enhanced Field Emission from Argon Plasma-Treated Ultra-sharp α-Fe2O3Nanoflakes

et al. 2009

View full text Add to dashboard Cite

Hematite nanoflakes have been synthesized by a simple heat oxide method and further treated by Argon plasmas. The effects of Argon plasma on the morphology and crystal structures of nanoflakes were investigated. Significant enhancement of field-induced electron emission from the plasma-treated nanoflakes was observed. The transmission electron microscopy investigation shows that the plasma treatment effectively removes amorphous coating and creates plenty of sub-tips at the surface of the nanoflakes, which are believed to contribute the enhancement of emission. This work suggests that plasma treatment technique could be a direct means to improve field-emission properties of nanostructures.

show abstract

Section: Introductionmentioning

confidence: 99%