Fragmentation behavior of Y 2 O 3 suspension in axially fed suspension plasma spray

Lee, Jung-ki; Park, Sangjun; Oh, Young−Jei; Kim, Seongwon; Kim, Hyung Sun; Lee, Sung-Min

doi:10.1016/j.surfcoat.2016.11.021

Cited by 18 publications

(11 citation statements)

References 17 publications

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“…The pores observed on the cross-section in Figure 3b came from partial or incomplete melting [15]. The porosity was 0.15% ± 0.01%, which was calculated by the image analyzing program and determined by averaging five randomly selected areas from the entire area of coating.…”

Section: Resultsmentioning

confidence: 99%

“…As shown in Figure 5b, large and small crater-like erosion sites were generated and contamination particles, which are shown as tiny dots in the figure, were observed on the Al2O3 surface after exposure to fluorocarbon plasma. As shown in Figure 5d, The pores observed on the cross-section in Figure 3b came from partial or incomplete melting [15]. The porosity was 0.15% ± 0.01%, which was calculated by the image analyzing program and determined by averaging five randomly selected areas from the entire area of coating.…”

Section: Resultsmentioning

confidence: 99%

“…The feeding rate of the suspension was 45 standard cubic centimeters per minute (sccm), and the flow rate of nitrogen atomizing gas was 30 sccm. The atomizing gas, which is injected to the feeding flow and splits the suspension droplets into small ones, turned out to affect the quality of the YOF coating because it made the droplet size of the suspension smaller and thus, the particles in the droplet melted more easily [14,15]. The transverse speed of the plasma gun was 1000 mm/s, and coating cycles were repeated 20 times during the entire spraying process.…”

Section: Methodsmentioning

confidence: 99%

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Plasma Etching Behavior of YOF Coating Deposited by Suspension Plasma Spraying in Inductively Coupled CHF3/Ar Plasma

Lee

Kim

et al. 2020

Coatings

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Dense yttrium oxyfluoride (YOF) coating was successfully deposited by suspension plasma spraying (SPS) with coaxial feeding. After deposition for 6 min at a plasma power of 105 kW, the thickness of the YOF coating was 55 ± 3.2 µm with a porosity of 0.15% ± 0.01% and the coating rate was ~9.2 µm/min. The crystalline structure of trigonal YOF was confirmed by X-ray diffractometry (XRD). The etching behavior of the YOF coating was studied using inductively coupled CHF3/Ar plasma in comparison with those of the Al2O3 bulk and Y2O3 coating. Crater-like erosion sites and cavities were formed on the whole surface of the Al2O3 bulk and Y2O3 coating. In contrast, the surface of the YOF coating showed no noticeable difference before and after exposure to the CHF3/Ar plasma. Such high resistance of the YOF coating to fluorocarbon plasma comes from the strongly fluorinated layer on the surface. The fluorination on the surface of materials was confirmed by X-ray photoelectron spectrum analysis (XPS). Depth profiles of the compositions of Al2O3, Y2O3, and YOF samples by XPS revealed that the fluorination layer of the YOF coating was much thicker than those of Al2O3 and Y2O3. These results indicate that if the inner wall of the semiconductor process chamber is coated by YOF using SPS, the generation of contamination particles would be minimized during the fluorocarbon plasma etching process.

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Section: Resultsmentioning

confidence: 99%

Section: Resultsmentioning

confidence: 99%

Section: Methodsmentioning

confidence: 99%

See 1 more Smart Citation

Plasma Etching Behavior of YOF Coating Deposited by Suspension Plasma Spraying in Inductively Coupled CHF3/Ar Plasma

Lee

Kim

et al. 2020

Coatings

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“…The solid content in a suspension feedstock affects the particle velocity and temperature and, ultimately, the coating microstructures (Ref 22,23). Usually, higher solid content is preferred due to the deposition of thicker layer per pass i.e., higher material deposition rate.…”

Section: Role Of Solid Content In the Suspension Feedstockmentioning

confidence: 99%

Suspension and Solution Precursor Plasma and HVOF Spray: A Review

Mittal

Paul

2022

J Therm Spray Tech

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Thermal spray, being a cost- and time-efficient process, is used extensively in industrial and engineering sections for mass production of desired coating structures, allowing to deposit a wide range of materials on various substrates. Conventionally, powder feedstocks are used in plasma and high-velocity oxy-fuel (HVOF) thermal spray that has limitations such as limited feedstock particle size (10-100 µm), clogging and limited options for coating materials. Liquid feedstocks, in the form of suspensions or precursor solutions could potentially resolve these issues by allowing nano- and submicron particles to be deposited, where unlike dry feedstock, the liquid medium helps in reducing the friction and avoiding the clogging. Also, liquid feedstocks, especially precursor solutions, provide the opportunity to deposit a wide range of coating materials with better control over coating microstructure, material composition and stoichiometry by varying the properties of the feedstock. Despite benefits, liquid feedstock has its own complexities, such as complex feedstock preparation, thermo-physical reactions during interaction with the energy source and gases. Therefore, it becomes essential to understand how different suspension and solution precursor feedstock properties affect the coating microstructures and properties. This review paper covers a detailed discussion on the role of different process parameters such as feedstock properties, injection methods, different torches and surface properties, affecting the coating quality and performance and related recent developments and challenges are discussed. This would be beneficial in optimizing the spray parameters to obtain coatings with desired microstructures. The later part of the review focuses on the economic aspect of the suspension/solution precursor-based plasma and HVOF spray methods and their various applications.

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“…However, these materials possess distinct disadvantages. For example, quartz has high plasma-etching characteristics, and Al 2 O 3 and Y 2 O 3 are costly and generate contaminant particles, because of the presence of grain boundaries [3][4][5]. Therefore, the semiconductor and display industries require an innovative material and coating technology with low plasma-etching characteristics that minimises the formation of contaminant particles.…”

Section: Introductionmentioning

confidence: 99%

Plasma resistance of quartz with a glass coating layer by aerosol deposition

Choi

Jeong

Kim

2018

Advances in Applied Ceramics

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To improve the plasma resistance behaviour, glass frits of SiO 2 -Al 2 O 3 -Y 2 O 3 with various powder sizes were coated onto quartz substrates by the aerosol deposition (AD) method. The thickness and microstructure of the coating layers were observed using a surface profiler and scanning electron microscopy. Plasma resistance was measured via the quartz substrate, after exposure to an inductively coupled plasma etcher. The coating layers were densely formed on the quartz substrates without additional heat treatment, and the layer thickness changed for the glass frit size distribution and AD process conditions. The SiO 2 -Al 2 O 3 -Y 2 O 3 glass coating layer showed a higher plasma resistance than quartz. Furthermore, the AD coating layer was evenly etched after plasma exposure. This study improves the lifetime of plasma chamber components in the semiconductor industry.

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Fragmentation behavior of Y 2 O 3 suspension in axially fed suspension plasma spray

Cited by 18 publications

References 17 publications

Plasma Etching Behavior of YOF Coating Deposited by Suspension Plasma Spraying in Inductively Coupled CHF3/Ar Plasma

Plasma Etching Behavior of YOF Coating Deposited by Suspension Plasma Spraying in Inductively Coupled CHF3/Ar Plasma

Suspension and Solution Precursor Plasma and HVOF Spray: A Review

Plasma resistance of quartz with a glass coating layer by aerosol deposition

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