2008
DOI: 10.1021/ja710994m
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Free-Standing, Patternable Nanoparticle/Polymer Monolayer Arrays Formed by Evaporation Induced Self-Assembly at a Fluid Interface

Abstract: We report a general and facile method to prepare free-standing, patternable nanoparticle/polymer monolayer arrays by interfacial NP assembly within a polymeric photoresist. The ultrathin monolayer nanoparticle/polymer arrays are sufficiently robust that they can be transferred to arbitrary substrates and suspended as free-standing membranes over cm-sized holeseven with free edges. More importantly, the polymethylmethacrylate (PMMA) in the system serves as a photoresist enabling two modes of electron beam (e-b… Show more

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Cited by 62 publications
(65 citation statements)
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“…On the other hand, a number of techniques have been proposed to pattern different porous oxides, including soft lithography, micro-pen lithography, ink-jet printing, dipcoating and electron beam lithography2122232425262728. These techniques have been used to hierarchically organize nanoporous materials for sensor arrays, micro fluidic or photonic systems.…”
mentioning
confidence: 99%
See 1 more Smart Citation
“…On the other hand, a number of techniques have been proposed to pattern different porous oxides, including soft lithography, micro-pen lithography, ink-jet printing, dipcoating and electron beam lithography2122232425262728. These techniques have been used to hierarchically organize nanoporous materials for sensor arrays, micro fluidic or photonic systems.…”
mentioning
confidence: 99%
“…Indirect approaches such as soft lithography21 suffer from complex process involving additional moulds that have to be patterned in advance. Some approaches including pen lithography, ink-jet printing and electron beam lithography write or print the patterns of functional materials directly22232425262728. But they are not efficient approaches that are designed for wafer-level processing, which is the key to batch fabrication of micro devices.…”
mentioning
confidence: 99%
“…For the quantum-dot fabrication and deposition, a close-packed PbS quantum-dot monolayer was created using evaporation-induced nanoparticles/polymer self-assembly [35]at a fluid interface, followed by monolayer transfer as recently reported [36]. Because the monolayer has a high modulus, it remains freely suspended over air holes without adhering to the side walls.…”
Section: All Lithography Was Performed On An Asml Pas 5500mentioning
confidence: 99%
“…Moreover, colloidal QDs provide greater material and functionality flexibilities. Incorporation of QD can occur during post-processing, under ambient conditions using self-assembly of ligand functionalized QDs [23,35,37]. These quantum dots are purchased from Evident Technologies.…”
Section: All Lithography Was Performed On An Asml Pas 5500mentioning
confidence: 99%
“…As recently reported [4], we create a close-packed PbS quantum-dot monolayer by evaporation-induced nanoparticles/polymer self-assembly at a fluid interface, followed by monolayer transfer.…”
mentioning
confidence: 96%