Friction and wear properties of amorphous and nanocrystalline Ta-Ag films at elevated temperatures as function of working pressure

Wang, Jun; Li, Jianliang; Li, Hang; Zhang, Xiafei; Huang, Jingjing; Xiong, Dangsheng

doi:10.1016/j.surfcoat.2018.08.058

Cited by 8 publications

(4 citation statements)

References 23 publications

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“…However, if there are initial C–Si and Si–Si bonds formed at the interface, they always break after further sliding of the upper film and cannot lead to the formation of bridging chains of multiple atoms (see Figure S5) due to their relatively smaller bond energies (320 and 183 kJ/mol, , respectively), compared with that of the C–C bond (411 kJ/mol). We observed that the Si-involved bridging chain can only be formed when an unsaturated atom (Si1) on the surface encountered the dangling bond of a just broken carbon chain (C3–C4–C5), as illustrated in Figure b.…”

Section: Resultsmentioning

confidence: 99%

Changing of the Interfacial Contacts and Shear Behaviors between a-C Films Caused by Si Doping

Duan

2023

Langmuir

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We used reactive molecular dynamics (ReaxFF-MD) to simulate the friction and shear behavior of a-C:Si films with varying Si content (0−20 at %). We found that the optimal doping content was 7.2 at%, which had similar friction to the undoped film but had smaller wear and running-in time (40 and 60% of the undoped film, respectively). Compared with the undoped film, the proper amount of Si doping significantly inhibited the formation of all-C bridging chains at the interface and prevented the formation of a large number of all-C and Si-involved bridging chains caused by surface dangling bonds at higher Si contents. Our study revealed the atomic scale mechanism of Si doping on the tribological properties of a-C films.

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Section: Resultsmentioning

confidence: 99%

Changing of the Interfacial Contacts and Shear Behaviors between a-C Films Caused by Si Doping

Duan

2023

Langmuir

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“…The H/E* and H 3 /E* 2 of TaC are higher than TaN, and much higher than Ta. In the literature [7,20,[40][41][42][43][44][45][46][47][48][49], many elements were incorporated into TiN films to form TaMeN (Me: Zr, W, B, Al, MoAl, etc.) films, resulting in an improvement of H/E* and H 3 /E* 2 .…”

Section: Mechanical Propertiesmentioning

confidence: 99%

“…Figure 8. The H 3 /E* 2 ratios as a function of H/E* for TaN/(Ta/Ti)/TiN multilayer films and films containing Ta in the literature, in comparison with the values measured under nanoindentation [7,20,[40][41][42][43][44][45][46][47][48][49]. The average values of H/E* and H 3 /E* 2 ratios are plotted in the figure, and the error bars are used as numerical intervals.…”

Section: Tribological and Adhesive Propertiesmentioning

confidence: 99%

Sandwich Structure to Enhance the Mechanical and Electrochemical Performance of TaN/(Ta/Ti)/TiN Multilayer Films Prepared by Multi-Arc Ion Plating

Yang

Yuan

et al. 2022

Coatings

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TaN/(Ta/Ti)/TiN multilayer films at various target to substrate distances (dts), composed of hexagonal TaN, (t-Ta/fcc-Ti) and fcc-TiN with a sandwich structure, were prepared via multi-arc ion plating. With increasing dts, the deposition rate of the films first increased and then decreased, and the average grain size increased from 11.9 to 13.9 nm and then decreased to 10.4 nm. The TaN/(Ta/Ti)/TiN multilayer films have a high ratio of hardness to elastic modulus (H/E*) and H3/E*2 ratios, displaying an outstanding level of both hardness and toughness compared with Ta-related films. The nano-multilayer TaTi interlayers inhibited the columnar structure and prolonged the corrosion diffusion path by increasing stable interfaces. The TaN/(Ta/Ti)/TiN multilayer film at dts = 220 mm exhibited comprehensive properties, including a high hardness of 25 GPa, strong adhesion strength of 68 N, low coefficient of friction of 0.41, low wear rate of 2.7 × 10−6 mm3(mN)−1 and great corrosion resistance in 3.5 wt% NaCl solution, showing promising application as a protective coating.

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“…Since the Ag atoms can diffuse through the dielectric layer and react with the oxygen of dielectric layer at high temperature and lead to poor low-emissivity property, chemical durability, corrosion resistance and thermal stability [13,14]. A simple method to solve this problem is the coating of a single-layer Ag-based alloy such as Ag-Ti, Ag-Nb and Ag-Ta alloys [15][16][17][18]. However, those works mainly focus on antibacterial and protective coating applications.…”

Section: Introductionmentioning

confidence: 99%

Fabrication and Characterization of Ag–Ta Thin Films by Co-Magnetron Sputtering as Alternative Layer for High Reflection of NIR Radiation

et al. 2022

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Silver–tantalum (Ag–Ta) thin films were fabricated by magnetron co-sputtering on silicon (Si) wafer (100) and glass slide substrates at room temperature. The Ag–Ta thin films were prepared at various deposition times of 5, 10, 20 and 30 s and the physical, structural and optical properties of the Ag–Ta thin films were investigated. It was determined that the thicknesses of the films were 7, 9, 17 and 33 nm, respectively. The results revealed that an increase in the film thickness leads to a monotonic increase in FCC and BCC phase of Ag and Ta, respectively. The work function and stoichiometric of the Ag–Ta thin films were investigated by ultraviolet and X-ray photoemission spectroscopies (UPS and XPS), respectively. The potential of Ag–Ta thin films to be used as low-emission coating was investigated using a spectrophotometer. A UV–VIS–NIR spectrophotometer was used to measure the spectral reflectance in the wavelength range from 300 to 2000 nm. The results showed that the Ag–Ta thin film deposited for 30 s exhibited higher reflectance in NIR region than those of 5, 10, 20 and 30 s. It demonstrated an average reflectance of about 80% and slightly decreased to 75% after being kept in the air atmosphere for 28 days. It can be likewise proposed as an alternative thin film with high reflectance of NIR radiation single layer to develop industrial low-emission coating for cost-effective, clean, and easy adaptation to a large area coating.

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Friction and wear properties of amorphous and nanocrystalline Ta-Ag films at elevated temperatures as function of working pressure

Cited by 8 publications

References 23 publications

Changing of the Interfacial Contacts and Shear Behaviors between a-C Films Caused by Si Doping

Changing of the Interfacial Contacts and Shear Behaviors between a-C Films Caused by Si Doping

Sandwich Structure to Enhance the Mechanical and Electrochemical Performance of TaN/(Ta/Ti)/TiN Multilayer Films Prepared by Multi-Arc Ion Plating

Fabrication and Characterization of Ag–Ta Thin Films by Co-Magnetron Sputtering as Alternative Layer for High Reflection of NIR Radiation

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