2002
DOI: 10.1016/s0921-4526(01)01388-6
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Full-band approaches for the quantum treatment of nanometer-scale MOS structures

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Cited by 3 publications
(5 citation statements)
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“…A new empirical PP related approach based on the LCBB has been recently applied to the nanostructure problem [21,[349][350][351] and to devices [29,259,352,353]. Here, the physical starting point for a description of the nanostructure is the Bloch functions of the materials forming the nanostructure, described in terms of local empirical PPs.…”
Section: Empirical Pseudopotential Methods: the Linear Combination Of...mentioning
confidence: 99%
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“…A new empirical PP related approach based on the LCBB has been recently applied to the nanostructure problem [21,[349][350][351] and to devices [29,259,352,353]. Here, the physical starting point for a description of the nanostructure is the Bloch functions of the materials forming the nanostructure, described in terms of local empirical PPs.…”
Section: Empirical Pseudopotential Methods: the Linear Combination Of...mentioning
confidence: 99%
“…This approach, without any approximation, was later applied by Wang et al [21] to the problem of -X mixing in low-dimensional nanostructures containing as many as one million atoms, and it was subsequently extended to strained nanostructures [349]. The self-consistent version of the LCBB method has been developed by Chirico et al and applied to AlGaAs/GaAs HEMT devices [29] and Si-based MOS devices [259,352,353,357]. In the following, we describe briefly the LCBB method; further details can be found in [21,29,349].…”
Section: Empirical Pseudopotential Methods: the Linear Combination Of...mentioning
confidence: 99%
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“…The atomic nature of the problem, where details of oxide structure and oxide-silicon interface have strong impact on the tunnelling current, calls for an atomistic description of the system. TB methods have been recently applied to study tunnelling currents in ultrathin MOS structures (Städele et al 2000, Demkov et al 2001, Sacconi et al 2002b. A comparison between ab initio density functional approach and TB method to treat atomic scale modelling of gate dielectrics is given in Kawamoto et al (2000).…”
Section: Gate Leakage Current In Mosmentioning
confidence: 99%