Van
der Waals heterostructures have attracted increasing interest, owing
to the combined benefits of their constituents. These hybrid nanostructures
can be realized via epitaxial growth, which offers a promising approach
for the controlled synthesis of the desired crystal phase and the
interface between van der Waals layers. Here, the epitaxial growth
of a continuous molybdenum disulfide (MoS
2
) film on large-area
graphene, which was directly grown on a sapphire substrate, is reported.
Interestingly, the grain size of MoS
2
grown on graphene
increases, whereas that of MoS
2
grown on SiO
2
decreases with an increasing amount of hydrogen in the chemical
vapor deposition reactor. In addition, to achieve the same quality,
MoS
2
grown on graphene requires a much lower growth temperature
(400 °C) than that grown on SiO
2
(580 °C). The
MoS
2
/graphene heterostructure that was epitaxially grown
on a transparent platform was investigated to explore its photosensing
properties and was found to exhibit inverse photoresponse with highly
uniform photoresponsivity in the photodetector pixels fabricated across
a full wafer. The MoS
2
/graphene heterostructure exhibited
ultrahigh photoresponsivity (4.3 × 10
4
A W
–1
) upon exposure to visible light of a wide range of wavelengths,
confirming the growth of a high-quality MoS
2
/graphene heterostructure
with a clean interface.