2017
DOI: 10.1007/s11664-017-5694-3
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Full Sputtering Deposition of Thin Film Solar Cells: A Way of Achieving High Efficiency Sustainable Tandem Cells?

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Cited by 10 publications
(6 citation statements)
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“…The brookite and anatase phases can easily be transformed into rutile structures by high-temperature annealing. Different ways of depositing TiO 2 thin films that are commonly employed include electron-beam evaporation [9], sol-gel spin coating method [10], Atomic layer deposition [11], magnetron sputtering [12], and spray pyrolysis [13]. Of these deposition procedures, the sol-gel spin-coated process is the most widely used.…”
Section: Introductionmentioning
confidence: 99%
“…The brookite and anatase phases can easily be transformed into rutile structures by high-temperature annealing. Different ways of depositing TiO 2 thin films that are commonly employed include electron-beam evaporation [9], sol-gel spin coating method [10], Atomic layer deposition [11], magnetron sputtering [12], and spray pyrolysis [13]. Of these deposition procedures, the sol-gel spin-coated process is the most widely used.…”
Section: Introductionmentioning
confidence: 99%
“…Depending on the cell material and the processing techniques solar cells are of two kinds based on wafer and thin film. Thin film solar cells have the key advantage of their dimensionality, having thickness a fraction of other types of solar cells and it is attractive in terms of cost factor with minimum material usage [1]. However thin film solar cells promise to achieve the goal with the low cost and high efficiency from CIGS to dye sensitized solar cells and recently with the advent of perovskite based materials for solar cells.…”
Section: Introductionmentioning
confidence: 99%
“…Deposition of CIGS junction on a soda lime glass substrate covered by Mo layer at 1 μm thick [1]. The best back contact material for CIGS solar cells was found to be molybdenum since it is having high conductivity and relative stability at the high processing temperature.…”
mentioning
confidence: 99%
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“…[18][19][20] For the majority of large-area deposition techniques, the sputtering technique is preferred because of large-area deposition, stoichiometry control, and uniform deposition over the surface. 21,22 Many approaches have been reported for the sputtering deposition of CIGS thin film layers. Dhere et al employed a multistage process in which metallic elements of In and Cu-Ga layers were deposited by sputtering prior to selenization to grow a CIGS material.…”
mentioning
confidence: 99%