Full three-dimensional morphology evolution of amorphous thin films for atomic layer deposition

Jin, Lingpeng; Li, Yawei; Hu, Zhigao; Chu, Junhao

doi:10.1063/1.5025008

Cited by 10 publications

(3 citation statements)

References 39 publications

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“…Random-based has a broad range of applications in finance, engineering, and science [ 89 , 90 , 91 , 92 ]. Monte Carlo simulation has been extensively used along with ALD for different purposes, e.g., determining film and precursor properties and the evolution of film morphology, modeling film growth, and studying the kinetics of reactions and the mechanism of materials processing in ALD [ 93 , 94 , 95 , 96 , 97 ]. Moreover, Kinetic Monte Carlo (kMC) simulation, which accounts for changes in the process with time, is invaluable in bridging the gap between individual reaction data from DFT and average growth characteristics from experiments [ 97 ].…”

Section: Theoretical Methodsmentioning

confidence: 99%

“…The morphology evolution of the films produced by ALD can be modeled and studied through Monte Carlo simulation. In a previous study, amorphous films deposited by ALD were examined with Monte Carlo simulation [ 94 ]. Based on the results, steric hindrance would delay the linear growth [ 94 ].…”

Section: Theoretical Studies On Aldmentioning

confidence: 99%

“…In a previous study, amorphous films deposited by ALD were examined with Monte Carlo simulation [ 94 ]. Based on the results, steric hindrance would delay the linear growth [ 94 ]. In addition, 3D Monte Carlo simulation has been used to determine the film thickness and sticking coefficients of TMA and bis-diethyl aminosilane (BDEAS) precursors in high-aspect-ratio 3D substrates [ 93 ].…”

Section: Theoretical Studies On Aldmentioning

confidence: 99%

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Recent Advances in Theoretical Development of Thermal Atomic Layer Deposition: A Review

et al. 2022

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Atomic layer deposition (ALD) is a vapor-phase deposition technique that has attracted increasing attention from both experimentalists and theoreticians in the last few decades. ALD is well-known to produce conformal, uniform, and pinhole-free thin films across the surface of substrates. Due to these advantages, ALD has found many engineering and biomedical applications. However, drawbacks of ALD should be considered. For example, the reaction mechanisms cannot be thoroughly understood through experiments. Moreover, ALD conditions such as materials, pulse and purge durations, and temperature should be optimized for every experiment. It is practically impossible to perform many experiments to find materials and deposition conditions that achieve a thin film with desired applications. Additionally, only existing materials can be tested experimentally, which are often expensive and hazardous, and their use should be minimized. To overcome ALD limitations, theoretical methods are beneficial and essential complements to experimental data. Recently, theoretical approaches have been reported to model, predict, and optimize different ALD aspects, such as materials, mechanisms, and deposition characteristics. Those methods can be validated using a different theoretical approach or a few knowledge-based experiments. This review focuses on recent computational advances in thermal ALD and discusses how theoretical methods can make experiments more efficient.

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Section: Theoretical Methodsmentioning

confidence: 99%

Section: Theoretical Studies On Aldmentioning

confidence: 99%

Section: Theoretical Studies On Aldmentioning

confidence: 99%

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Recent Advances in Theoretical Development of Thermal Atomic Layer Deposition: A Review

et al. 2022

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Electrospun cellulose acetate/P(DMDAAC‐AM) nanofibrous membranes for dye adsorption

Peng

Zhang

et al. 2019

J of Applied Polymer Sci

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In recent years, organic nanofibrous membranes have received more attention because of their excellent performance in wastewater treatment. In this study, the soluble poly(dimethyldiallylammonium chloride‐acrylamide) (P(DMDAAC‐AM)) was first synthesized by aqueous copolymerization. Afterward, cellulose acetate (CA)/P(DMDAAC‐AM) composite nanofibrous membranes were electrospun and utilized to remove acid black 172 from simulated wastewater. When the proportion of P(DMDAAC‐AM) to CA was 20, 30, and 40 wt %, the equilibrium adsorption capacities were 116, 159, and 192 mg g−1, respectively. The adsorption capacity of CA/P(DMDAAC‐AM) composite nanofibrous membrane showed a well linear relationship with the average fiber diameter. When the average fiber diameter was 185 nm, the adsorption capacity of 231 mg g−1 was achieved. The adsorption kinetics of CA/P(DMDAAC‐AM) membranes with various fiber diameters was all consistent with the pseudo‐second‐order model. The rate‐limiting step was primarily controlled by chemisorption. The adsorption isothermal data fitted well with the Langmuir isotherm model. The prepared CA/P(DMDAAC‐AM) nanofibrous membrane was effective to remove the acid black 172 in the environmental interested pH range of 4.0–10.0. As an effective dye adsorbent, CA/P(DMDAAC‐AM) nanofibrous membrane shows wide application prospect with its excellent adsorption performance. © 2019 Wiley Periodicals, Inc. J. Appl. Polym. Sci. 2020, 137, 48565.

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Low-temperature atomic layer deposition as an advanced fabrication technique of semiconductor polymer materials

Chiappim,

Botan Neto,

Pessoa

et al. 2024

Semiconducting Polymer Materials for Biosensing Applications

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Full three-dimensional morphology evolution of amorphous thin films for atomic layer deposition

Cited by 10 publications

References 39 publications

Recent Advances in Theoretical Development of Thermal Atomic Layer Deposition: A Review

Recent Advances in Theoretical Development of Thermal Atomic Layer Deposition: A Review

Electrospun cellulose acetate/P(DMDAAC‐AM) nanofibrous membranes for dye adsorption

Low-temperature atomic layer deposition as an advanced fabrication technique of semiconductor polymer materials

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