2019
DOI: 10.1126/sciadv.aay5141
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Full voltage manipulation of the resistance of a magnetic tunnel junction

Abstract: One of the motivations for multiferroics research is to find an energy-efficient solution to spintronic applications, such as the solely electrical control of magnetic tunnel junctions. Here, we integrate spintronics and multiferroics by depositing MgO-based magnetic tunnel junctions on ferroelectric substrate. We fabricate two pairs of electrodes on the ferroelectric substrate to generate localized strain by applying voltage. This voltage-generated localized strain has the ability to modify the magnetic aniso… Show more

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Cited by 50 publications
(57 citation statements)
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References 50 publications
(79 reference statements)
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“…Naturally, the magnetic states of the FL should be responsible for the TMR response to the E- and H-fields in the hybrid device (see details in Figure S7 in the supplemental information ). Therefore, the CTC results again demonstrate that E-field-induced magnetoelastic anisotropy is the primary contributor over the magnetic anisotropy rotation and the relative magnetization orientation of the FL with respect to the RL ( Chen et al., 2019b , 2019c ).…”
Section: Resultsmentioning
confidence: 71%
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“…Naturally, the magnetic states of the FL should be responsible for the TMR response to the E- and H-fields in the hybrid device (see details in Figure S7 in the supplemental information ). Therefore, the CTC results again demonstrate that E-field-induced magnetoelastic anisotropy is the primary contributor over the magnetic anisotropy rotation and the relative magnetization orientation of the FL with respect to the RL ( Chen et al., 2019b , 2019c ).…”
Section: Resultsmentioning
confidence: 71%
“…Figure 1 B shows the layered sequence of the MTJ stack, including the FL and RL components. The Ta/Ru/Ta/CoFe/IrMn assembly serves as the top electrode, and the Au layer below the PMN-PT serves as the bottom electrode for the applied E-fields, saving the top MTJ ovals from the potential damage as a result of the E-field ( Wang et al., 2012 ; Chen et al., 2019c ). The length of the MTJ ovals is along the in-plane [100] direction of the PMN-PT substrate.…”
Section: Resultsmentioning
confidence: 99%
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“…1, the aspect ratio of the fixed layer in MTJ is smaller than that of the free layer, which is not conducive to maintaining the fixed magnetisation when current is applied. In order to ensure that the magnetisation direction of the fixed layer does not change, an antiferromagnetic IrMn layer can be placed on the fixed layer to pin the fixed layer [27].…”
Section: Input Interface Based On Magnetic Tunnel Junction (Mtj) and mentioning
confidence: 99%