2014
DOI: 10.1016/j.ceramint.2014.03.145
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Fully crystallized ultrathin ITO films deposited by sputtering with in-situ electron beam irradiation for touch-sensitive screens

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Cited by 27 publications
(11 citation statements)
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“…2(b). The average optical transmittance in the 400-1100 nm wavelength range was between 90% and 95% for the different areas of graphene film, which was higher than the average optical transmittance of ITO films (80% to 90%) reported previously [25][26][27][28]. Fig.…”
Section: Characterization Of Graphenecontrasting
confidence: 56%
See 1 more Smart Citation
“…2(b). The average optical transmittance in the 400-1100 nm wavelength range was between 90% and 95% for the different areas of graphene film, which was higher than the average optical transmittance of ITO films (80% to 90%) reported previously [25][26][27][28]. Fig.…”
Section: Characterization Of Graphenecontrasting
confidence: 56%
“…(1)-(4), we could calculate that the sheet resistance (R s ) of the graphene film was 1096.20 Ω/sq (the corresponding resistivity was 7.45 Â 10 À 5 Ω cm), which was lower than the resistivity of ITO films (10 À 4 Ω cm to 10 À 2 Ω cm) reported previously [25][26][27][28].…”
Section: Room Temperature Transport Measurementsmentioning
confidence: 96%
“…After we made the AgNWs on glass, an electron beam (Infovion inc.) irradiated them for 0–180 sec with a RF power of 150 W and a DC power of 1.5 kV in a vacuum chamber. The electron beam source consisted of an inner RF (13.56 MHz) coil antenna and two grid electrodes for discharging Ar plasma and for collimating/accelerating the electron beam towards the substrate, respectively 22 . The sheet resistance of the AgNWs was measured using a four-point probe.…”
Section: Methodsmentioning
confidence: 99%
“…However, decreasing growth temperature would affect the electrical stability of ITO thin films under multiple environmental conditions [12], and decreasing film thickness deteriorates the uniformity of both thickness and sheet resistance of ITO thin films. In recent years, a large number of works focused on how to prepare low resistivity ITO thin films with ultrathin thickness [5,[12][13][14][15]. The objective of the most work on ITO thin films is to maximize the conductivity while simultaneously maximizing the optical transmittance.…”
Section: Introductionmentioning
confidence: 99%