Scanning microscopy
methods are crucial for the advancement of
nanoelectronics. However, the vertical nanoprobes in such techniques
suffer limitations such as the fragility at the tip–sample
interface, complex instrumentation, and the lack of in operando functionality
in several cases. Here, we introduce scanning plasmon-enhanced microscopy
(SPEM) and demonstrate its capabilities on MoS2 and WSe2 nanosheets. SPEM combines a nanoparticle-on-mirror (NPoM)
configuration with a portable conductive cantilever, enabling simultaneous
optical and electrical characterization. This distinguishes it from
other current techniques that cannot provide both characterizations
simultaneously. It offers a competitive optical resolution of 600
nm with local enhancement of optical signal up to 20,000 times. A
single gold nanoparticle with a 15 nm radius forms pristine, nondamaging
van der Waals contact, which allows observation of unexpected p-type
behavior of MoS2 at the nanoscale. SPEM reconstructs the
NPoM method by eliminating the need for extensive statistical analysis
and offering excellent nanoscale mapping resolution of any selected
region. It surpasses other scanning techniques in combining precise
optical and electrical characterization, interactive simplicity, tip
durability, and reproducibility, positioning it as the optimal tool
for advancing nanoelectronics.